Patents by Inventor Johnannes Onvlee

Johnannes Onvlee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120320359
    Abstract: A lithographic apparatus having a substrate table constructed to hold a substrate and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may include a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.
    Type: Application
    Filed: February 18, 2011
    Publication date: December 20, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johnannes Onvlee, Erik Christiaan Fritz