Patents by Inventor Johnathan L. Barnes

Johnathan L. Barnes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7600858
    Abstract: A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: October 13, 2009
    Assignee: Lexmark International, Inc.
    Inventors: Johnathan L. Barnes, Craig M. Bertelsen, Brian C. Hart, Gary R. Williams, Sean T. Weaver, Girish S. Patil
  • Patent number: 7254890
    Abstract: A method of making a micro-fluid ejection head structure for a micro-fluid ejection device. The method includes applying a removable mandrel material to a semiconductor substrate wafer containing fluid ejection actuators on a device surface thereof. The mandrel material is shaped to provide fluid chamber and fluid channel locations on the substrate wafer. A micro machinable material is applied to the shaped mandrel and the device surface of the wafer to provide a nozzle plate and flow feature layer on the shaped mandrel and wafer. A plurality of nozzle holes are formed in the nozzle plate and flow feature layer. The shaped mandrel material is then removed from the device surface of the substrate wafer to provide fluid chambers and fluid channels in the nozzle plate and flow feature layer.
    Type: Grant
    Filed: December 30, 2004
    Date of Patent: August 14, 2007
    Assignee: Lexmark International, Inc.
    Inventors: Johnathan L. Barnes, Craig M. Bertelsen, Brian C. Hart, Gary R. Williams, Sean T. Weaver, Girish S. Patil