Patents by Inventor Johnny B. Covington

Johnny B. Covington has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
    Patent number: 4657844
    Abstract: A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, x-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
    Type: Grant
    Filed: May 14, 1985
    Date of Patent: April 14, 1987
    Assignee: Texas Instruments Incorporated
    Inventors: Jing S. Shu, Johnny B. Covington, Wei Lee, Larry G. Venable, Gilbert L. Varnell