Abstract: During a teaching operation regarding a transport mechanism, a hand of the transport mechanism is moved to a tentative target position in a substrate supporter, and a substrate supported at a reference position in the substrate supporter is received by the hand. A positional relationship between the substrate held by the hand and the hand is detected. A deviation between the tentative target position and the reference position is acquired as correction information based on the detected positional relationship. During the teaching operation or during substrate processing, the tentative target position is corrected to a true target position to coincide with the reference position based on the acquired correction information. During the substrate processing, the hand is moved to the true target position, so that the substrate is transferred to the substrate supporter by the hand, or the substrate is received from the substrate supporter by the hand.

Abstract: Disclosed are a substrate treating apparatus and a substrate transporting method. A first treating block includes a developing-treatment layer and an interface layer arranged in an up-down direction. Accordingly, the interface layer is couplable with the indexer block. Moreover, a substrate transport mechanism of the indexer block transports a substrate from one of buffer units located at a predetermined height position in a substrate buffer to another of the buffer units located at a different height position in the substrate buffer. Accordingly, the interface layer is accessible to the buffer unit located at a height position corresponding to the interface layer. Thus, the interface layer can be made compact. Moreover, the interface layer is located in the upper part or the lower part of the developing-treatment layer, leading to reduction in footprint.

Abstract: A substrate carrier apparatus includes a hand, an advancing/retracting mechanism, an elevation mechanism, a movement mechanism, and a detector. The advancing/retracting mechanism moves the hand in a forward and backward direction to cause the hand to enter and be retracted from a substrate container. The elevation mechanism elevates the hand so that the hand lifts a substrate from below. The movement mechanism moves the hand to a position facing the substrate container. The detector detects a position of the substrate in the forward and backward direction in an entry state where the advancing/retracting mechanism causes the hand to enter the substrate container, moves integrally with the hand, and is disposed at a position adjacent to the substrate in a measurement direction intersecting with the forward and backward direction.

Abstract: Disclosed is a substrate treating system and a substrate transporting method. A substrate transport mechanism of an indexer block can take a substrate W into and out of a carrier placed on a platform. Moreover, the substrate transport mechanism transports the substrate W between two treatment layers at different height positions in a first treating block and a second treating block. Accordingly, any delivery block configured to move substrates between two treatment layers in an up-down direction is not necessarily provided between the indexer block and the treating block as in the prior art. This achieves suppression of a footprint of the substrate treating system.

Abstract: Disclosed are a substrate treating apparatus and a substrate transporting method for the substrate treating apparatus. Two treating blocks are arranged so as not to be stacked, and a first treating block, an ID block, and a second treating block are linearly connected horizontally. Accordingly, the number of treatment layers is increasable while a height of the substrate treating apparatus is suppressed. The first and second treating blocks are each connected to the ID block directly. This enables suppression in step of passing a substrate through a treating block without performing any treatment on the substrate, leading to prevention of decrease in throughput. In addition, a substrate buffer is placed in the middle of the two treating blocks. The two treating blocks enable transportation of substrates W with the substrate buffer. Thus, reduction in footprint of the substrate treating apparatus is obtainable.

Abstract: Disclosed is a substrate treating system and a substrate transporting method. For instance, it is assumed that an indexer block, a first treating block, and a second treating block are arranged in this order. In this case, for transporting a substrate treated in the second treating block to an indexer block, the substrate is necessarily sent through the first treating block without any treatment in the first treating block. However, the first treating block and the second treating block are both connected to the indexer block. Therefore, transportation of the substrate is performable directly from the second treating block to the indexer block without through the first treating block. Therefore, reduction in throughput is suppressible.

Abstract: Disclosed is a substrate transporting device including a transport mechanism, a transport chamber, a first exhaust fan, and a controller. The transport mechanism is movable in parallel in a given direction. The transport chamber includes a first wall disposed on a first side of the given direction of the transport mechanism, and a plurality of transportation ports each used for moving the substrate between an exterior and an interior of the transport chamber. The first exhaust fan is disposed closer to the first wall than any of the transportation ports, and exhausts gas in the transport chamber outside the transport chamber. The controller performs control such that, when the transport mechanism moves toward the first wall in a first proximal area whose distance from the first wall is of a given value or less, an exhaust amount of the first exhaust fan is larger than that when the transport mechanism moves toward the first wall out of the first proximal area.

Abstract: Disclosed is a substrate treating apparatus, a carrier transporting method, and a carrier buffer device. A carrier transport mechanism transports a carrier between platforms of two openers and carrier storage shelves. The carrier storage shelves and the carrier transport mechanism are each mounted on a first treating block. Accordingly, there is no need as before to provide the carrier storage shelves and the carrier transport mechanism horizontally in an extended manner from the indexer block, achieving reduction in installation area extending horizontally. In other words, reduction in footprint of a substrate treating apparatus is obtainable.

Abstract: Disclosed are a substrate treating apparatus and a substrate transporting method. A platform is placed on a first ID block, and a platform is placed on a second ID block. A currently-used carrier platform is provided only on the first ID block. Accordingly, a substrate is transported in both a forward path and a return path between the first ID block and an IF block. According to the disclosure, the substrate is sent in the return path from the IF block to the second ID block disposed between a coating block and a developing block without being transported from the IF block to the first ID block. Consequently, transportation process in the return path by the coating block disposed between the first ID block and the second ID block is reduced. As a result, an entire throughput of a substrate treating apparatus can be enhanced.

Abstract: Disclosed are a substrate treating apparatus and a substrate transporting method. A first ID block takes a substrate from a carrier placed on a carrier platform and sends the taken substrate to one of six treatment layers. Moreover, a second ID block returns the substrate, sent from the treatment layer, for example, to a carrier placed on a platform. This allows the first ID block to transport many substrates to the six treatment layers arranged in an upward/downward direction more rapidly. Moreover, this simultaneously allows the second ID block to transport many substrates, having been sent from the six treatment layers arranged in the upward/downward direction, to the carrier more rapidly. As a result, a throughput of a substrate treating apparatus can be enhanced.

Abstract: Disclosed is a substrate treating apparatus and a substrate transporting method. An ID block 2, a coating block 3, a developing block 4, and an IF block 6 are arranged in this order. A platform 13 is placed on the ID block 2, and a platform 47 is placed on the IF block 6. A currently-used carrier platform is provided only on an ID block. Accordingly, a substrate is transported in both a forward path and a return path between the ID block and the IF block. According to the disclosure, a substrate W is transported from the IF block 6 to the developing block 4 in the return path, and thereafter, the substrate W is returned back from the developing block 4 to the IF block 6 without being transported to the coating block 3. Consequently, transportation process by the coating block 3 in the return path is reduced so that an entire throughput of a substrate treating apparatus 1 can be enhanced.

Abstract: Disclosed are a substrate treating apparatus and a substrate transporting method. A platform is disposed on a first ID block, and a platform is placed on a second ID block. A currently-used carrier platform is provided only on the first ID block. Accordingly, a substrate is transported in both a forward path and a return path between the first ID block and a second treating block. According to the disclosure, the substrate is returned not to the first ID block but to the second ID block disposed between the two treating blocks in the return path. Thus, transportation process by the first treating block disposed between the first ID block and the second ID block is reduced in the return path. As a result, an entire throughput of a substrate treating apparatus can be enhanced.

Abstract: A substrate treating apparatus includes a transporting space, transport mechanisms, and heat-treating sections. The transport mechanisms are provided in the transporting space. The heat-treating section, transporting space, and heat-treating section are aligned in the stated order in a transverse direction. One heat-treating section includes a plurality of heat-treating units. The heat-treating units are arranged in a longitudinal direction. The other heat-treating section includes a plurality of heat-treating units. These heat-treating units are also arranged in the longitudinal direction. One transport mechanism transports substrates to the heat-treating units. The other transport mechanism also transports substrates to the heat-treating units.

Abstract: A portion position calculator calculates positions of first to fifth portions of a substrate on a hand based on detection signals of first to fifth detectors. An imaginary circle calculator calculates four different imaginary circles based on the positions of the first to fourth portions, respectively, to calculate a center position of each imaginary circle. A substrate position determiner calculates a plurality of amounts of deviation among the plurality of center positions. When all of the plurality of amounts of deviation are not more than a threshold value, the substrate position determiner determines a position of the substrate on the hand based on any or all of the four imaginary circles.

Abstract: A substrate treating apparatus includes an indexer division, stories, and a controller. Each of the stories includes a first rack, a treating section, and a main transport mechanism. The indexer division includes a carrier rack and a transport device. The transport device performs a feeding operation for transporting substrates from a carrier placed on the carrier rack to the first rack. The transport device further performs an inter-story transporting operation for transporting the substrates between two first racks provided for different stories.

Abstract: A substrate treating apparatus includes first and second transport mechanisms, an intermediate transport mechanism, first and second intermediate parts, and a controller. The intermediate transport mechanism is disposed between the first and second transport mechanisms. The first intermediate part is disposed within a first overlapped area where the first transport mechanism and the intermediate transport mechanism are capable of transporting a substrate. The substrate is placed in the first intermediate part. The second intermediate part is disposed within a second overlapped area where the intermediate transport mechanism and the second transport mechanism are capable of transporting the substrate. The substrate is placed in the second intermediate part. The intermediate transport mechanism repeats cycle operation based on the controller's control.

Abstract: Each of first and second substrate transportation mechanisms transports a substrate for a FOUP placed not on, for example, each of two openers disposed laterally but on, for example, each of two openers disposed in an upward/downward direction. Thus, even if the number of openers increases, the substrate is transported not by sliding a hand capable of moving forward and backward, but by lifting, lowering, and rotating the hand. Thus, transportation of the substrate can be simplified. Accordingly, standby time of substrate transportation can be reduced, and a decrease in substrate transportation efficiency can be prevented.

Abstract: A second substrate transportation mechanism is generally set to transport a substrate from a substrate buffer unit to a FOUP placed on an opener. However, if a predetermined condition is satisfied, the second substrate transportation mechanism transports a substrate from the FOUP to the substrate buffer unit. That is, the second substrate transportation mechanism performs an operation different from an ordinary substrate transportation operation. Accordingly, a FOUP transportation mechanism can leave a specific FOUP at a placement position (opener) of the specific FOUP from when all the substrates are taken from the specific FOUP to when all the treated substrates are accommodated in the specific FOUP. Thus, the FOUP transportation mechanism can transport FOUPs except for the specific FOUP so that FOUP transportation efficiency can be enhanced.

Abstract: A substrate treating apparatus includes the following elements: an indexer block including indexer robots provided for respective carrier receivers and disposed in horizontally fixed positions, each of the indexer robots having arms for taking substrates out of a carrier and loading the substrates into the carrier on the carrier receiver; a bridge block disposed adjacent the indexer block; and a treating block including a plurality of stacked stories each having at least one treating unit. The bridge block includes a buffer, a pass having a plurality of tables covering a range from a bottom story to a top story of the plurality of stories, and two bridge robots each having an arm for transferring the substrates to and from the pass.

Abstract: In a substrate processing apparatus, an optical sensor is provided at a hand that transports a substrate to a processing unit, and an optical fiber is provided at a fixed member that has a certain positional relationship with a spin chuck in the processing unit. When the hand has a predetermined positional relationship with the spin chuck in the processing unit, the light emitted from a first light emitter of the optical sensor is received by a second light receiver of the optical fiber and guided to a second light emitter of the optical fiber, and the light emitted from the second light emitter is received by a first light receiver. A light receiving signal corresponding to an amount of light received by the first light receiver is output from the optical sensor.