Patents by Inventor Joji Okada

Joji Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing integrated circuit
    Publication number: 20030148549
    Abstract: In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 7, 2003
    Inventors: Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori, Ko Miyazaki
  • Method of manufacturing integrated circuit
    Publication number: 20030148608
    Abstract: In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 7, 2003
    Inventors: Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori, Ko Miyazaki
  • Method of manufacturing integrated circuit
    Publication number: 20030148635
    Abstract: In order to shorten the period for the development and manufacture of a semiconductor integrated circuit device, at the time of transferring integrated circuit patterns onto a wafer by an exposure process, a photomask PM1 is used which is provided partially with light shielding patterns 3a formed of a resist film, in addition to light shielding patterns formed of a metal.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 7, 2003
    Inventors: Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori, Ko Miyazaki
  • Manufacturing method of photomask and photomask
    Publication number: 20020006555
    Abstract: In order to shorten the time required to change or correct a mask pattern over a mask, light-shielding patterns formed of a resist film for integrated circuit pattern transfer are partly provided over a mask substrate constituting a photomask in addition to light-shielding patterns formed of a metal for the integrated circuit pattern transfer.
    Type: Application
    Filed: June 18, 2001
    Publication date: January 17, 2002
    Inventors: Norio Hasegawa, Toshihiko Tanaka, Joji Okada, Kazutaka Mori, Ko Miyazaki