Patents by Inventor Jon Edward Podolske
Jon Edward Podolske has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7416680Abstract: A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant adsorbed and/or precipitated onto a surface of the colloidal particles and/or substrate. The surfactant has a hydrophobic section that forms a steric hindrance barrier and substantially prevents contaminates, including colloidal particles, from bonding to the substrate surface. The slurry is applied to the surface of the substrate while a pad mechanically rubs the surface. Subsequent cleaning with standard soap solutions removes substantially all remaining contamination from the substrate surface. In an exemplary embodiment, the slurry is used to superfinish a glass disk substrate to a surface roughness of less than 2 ?, with substantially no surface contamination as seen by atomic force microscopy (AFM) after standard soap cleaning steps.Type: GrantFiled: October 12, 2001Date of Patent: August 26, 2008Assignee: International Business Machines CorporationInventors: Frederick Paul Benning, James A. Hagan, Steven L. Maynard, David C. Paurus, Douglas Howard Piltingsrud, Jon Edward Podolske
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Patent number: 7390423Abstract: A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant adsorbed and/or precipitated onto a surface of the colloidal particles and/or substrate. The surfactant has a hydrophobic section that forms a steric hindrance barrier and substantially prevents contaminates, including colloidal particles, from bonding to the substrate surface. The slurry is applied to the surface of the substrate while a pad mechanically rubs the surface. Subsequent cleaning with standard soap solutions removes substantially all remaining contamination from the substrate surface. In an exemplary embodiment, the slurry is used to superfinish a glass disk substrate to a surface roughness of less than 2 ?, with substantially no surface contamination as seen by atomic force microscopy (AFM) after standard soap cleaning steps.Type: GrantFiled: December 9, 2004Date of Patent: June 24, 2008Assignee: International Business Machines CorporationInventors: Frederick Paul Benning, James A. Hagan, Steven L. Maynard, David C. Paurus, Douglas Howard Piltingsrud, Jon Edward Podolske
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Patent number: 7070703Abstract: A polished glass disk is prepared for a magnetically recordable coating by texturing the surfaces with a highly abrasive material being abrasively engaged with the surfaces as the disk is rotated, thereby creating a relatively coarse texture with the abrasions concentric with the axis of rotation of the disk. Thereafter, the roughness of the texturing is reduced by abrading the surface of the disk with a polishing pad and an etchant slurry of colloidal silica. The etchant component has the property of attacking or softening the glass disk during the fine polishing with the colloidal silica slurry. As both the texturing step and the fine polishing step deposit a plurality of concentric abrasions on a glass disk, these abrasions aid in retaining the magnetically recordable coating deposited thereon to complete a magnetically recordable disk for use as a data storage member.Type: GrantFiled: May 23, 2002Date of Patent: July 4, 2006Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Frederick P. Benning, Steven L. Maynard, David C. Paurus, Jon Edward Podolske
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Patent number: 6752687Abstract: A method of preparing for a disk polishing operation includes providing a polishing machine having a first and a second superposed platen. A first polishing pad is on the first platen and a second polishing pad is on the second platen. A plurality of carriers are disposed between the first and second polishing pads. Each carrier is adapted to rotate relative to the polishing pads and is adapted to carry at least one glass disk. A pressure, temperature and rotational speed of the polishing machine used during a disk polishing operation are determined. A number of diamond disks are provided. A diamond disk is placed in respective ones of the carriers. The polishing machine is operated at or near the determined pressure, temperature and rotational speed while simultaneously dressing the respective surfaces of the polishing pads using the diamond disks.Type: GrantFiled: April 30, 2001Date of Patent: June 22, 2004Assignee: International Business Machines CorporationInventors: Frederick P. Benning, Steven L. Maynard, David C. Paurus, Jon Edward Podolske
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Patent number: 6736705Abstract: Disk substrates are polished in a process which uses a single load of the disks to a polishing apparatus and a single polishing slurry. Preferably, the process varies at least one polishing parameter at multiple stages to achieve both a reasonable rate of removal during one stage and a smooth finished surface during another stage. Preferably, a fine grit cerium oxide slurry is used, along with a polishing pad having surface characteristics intermediate those of relatively hard pads typically used for material removal, and of relatively soft pads typically used for fine finishing. The polisher operates at high pressure and speed during a material removal stage, and then reduces speed and pressure during a finishing stage to achieve a suitable surface finish, without removing and cleaning disks between the two stages.Type: GrantFiled: April 27, 2001Date of Patent: May 18, 2004Assignee: Hitachi Global Storage TechnologiesInventors: Frederick P. Benning, Douglas Allan Kuchta, Steven L. Maynard, Jon Edward Podolske
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Publication number: 20030217989Abstract: A polished glass disk is prepared for a magnetically recordable coating by texturing the surfaces with a highly abrasive material being abrasively engaged with the surfaces as the disk is rotated, thereby creating a relatively coarse texture with the abrasions concentric with the axis of rotation of the disk. Thereafter, the roughness of the texturing is reduced by abrading the surface of the disk with a polishing pad and an etchant slurry of colloidal silica. The etchant component has the property of attacking or softening the glass disk during the fine polishing with the colloidal silica slurry. As both the texturing step and the fine polishing step deposit a plurality of concentric abrasions on a glass disk, these abrasions aid in retaining the magnetically recordable coating deposited thereon to complete a magnetically recordable disk for use as a data storage member.Type: ApplicationFiled: May 23, 2002Publication date: November 27, 2003Applicant: INTERNATONAL BUSINESS MACHINES CORPORATIONInventors: Frederick P. Benning, Steven L. Maynard, David C. Paurus, Jon Edward Podolske
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Publication number: 20030073385Abstract: A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant adsorbed and/or precipitated onto a surface of the colloidal particles and/or substrate. The surfactant has a hydrophobic section that forms a steric hindrance barrier and substantially prevents contaminates, including colloidal particles, from bonding to the substrate surface. The slurry is applied to the surface of the substrate while a pad mechanically rubs the surface. Subsequent cleaning with standard soap solutions removes substantially all remaining contamination from the substrate surface. In an exemplary embodiment, the slurry is used to superfinish a glass disk substrate to a surface roughness of less than 2 Å, with substantially no surface contamination as seen by atomic force microscopy (AFM) after standard soap cleaning steps.Type: ApplicationFiled: October 12, 2001Publication date: April 17, 2003Applicant: International Business Machines CorporationInventors: Frederick Paul Benning, James A. Hagan, Steven L. Maynard, David C. Paurus, Douglas Howard Piltingsrud, Jon Edward Podolske
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Publication number: 20020173222Abstract: Disk substrates are polished in a process which uses a single load of the disks to a polishing apparatus and a single polishing slurry. Preferably, the process varies at least one polishing parameter at multiple stages to achieve both a reasonable rate of removal during one stage and a smooth finished surface during another stage. Preferably, a fine grit cerium oxide slurry is used, along with a polishing pad having surface characteristics intermediate those of relatively hard pads typically used for material removal, and of relatively soft pads typically used for fine finishing. The polisher operates at high pressure and speed during a material removal stage, and then reduces speed and pressure during a finishing stage to achieve a suitable surface finish, without removing and cleaning disks between the two stages.Type: ApplicationFiled: April 27, 2001Publication date: November 21, 2002Applicant: International Business Machines CorporationInventors: Frederick P. Benning, Douglas Allan Kuchta, Steven L. Maynard, Jon Edward Podolske
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Publication number: 20020160689Abstract: A method of preparing for a disk polishing operation includes providing a polishing machine having a first and a second superposed platen. A first polishing pad is on the first platen and a second polishing pad is on the second platen. A plurality of carriers are disposed between the first and second polishing pads. Each carrier is adapted to rotate relative to the polishing pads and is adapted to carry at least one glass disk. A pressure, temperature and rotational speed of the polishing machine used during a disk polishing operation are determined. A number of diamond disks are provided. A diamond disk is placed in respective ones of the carriers. The polishing machine is operated at or near the determined pressure, temperature and rotational speed while simultaneously dressing the respective surfaces of the polishing pads using the diamond disks.Type: ApplicationFiled: April 30, 2001Publication date: October 31, 2002Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Frederick P. Benning, Steven L. Maynard, David C. Paurus, Jon Edward Podolske