Patents by Inventor Jon HANDER

Jon HANDER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electrochemical deposition systems
    Patent number: 11608563
    Abstract: An electrochemical deposition system for depositing metal onto a workpiece, comprises a deposition chamber adapted to receive plating solution, a workpiece holder for holding a workpiece in a first plane, a shield holder for holding a shield in a second plane substantially parallel to the first plane, an agitation plate having a profiled surface to agitate plating solution, wherein the workpiece holder, shield holder and agitation plate are all adapted for insertion into and removal from the deposition chamber, and further comprising an actuator operable to change a relative distance between the workpiece holder and shield holder, in a direction normal to the first and second planes, while they are located within the deposition chamber.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: March 21, 2023
    Assignee: ASMPT NEXX, INC.
    Inventors: Arthur Keigler, Dave Guarnaccia, Demetrius Papapanaiyatou, Jon Hander, Robert Moon
  • ELECTROCHEMICAL DEPOSITION SYSTEMS
    Publication number: 20210017661
    Abstract: An electrochemical deposition system for depositing metal onto a workpiece, comprises a deposition chamber adapted to receive plating solution, a workpiece holder for holding a workpiece in a first plane, a shield holder for holding a shield in a second plane substantially parallel to the first plane, an agitation plate having a profiled surface to agitate plating solution, wherein the workpiece holder, shield holder and agitation plate are all adapted for insertion into and removal from the deposition chamber, and further comprising an actuator operable to change a relative distance between the workpiece holder and shield holder, in a direction normal to the first and second planes, while they are located within the deposition chamber.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 21, 2021
    Inventors: Arthur KEIGLER, Dave GUARNACCIA, Demetrius PAPAPANAIYATOU, Jon HANDER, Robert MOON