Abstract: A multi-well microfiltration apparatus and method are provided and feature a manual touch-off system for transferring pendent drops hanging from discharge-conduits of a discharge-conduit array to respective receiving wells or receiving holes of a corresponding receiving array, with minimum or no cross-contamination between the discharge conduits, or the receiving wells or receiving holes. The manual touch-off is achieved by manually shifting a carriage that supports one of the arrays, into a position whereat pendent drops of fluid hanging from the distal ends of the discharge conduits contact the inner sidewalls of the corresponding receiving wells or receiving holes of the receiving array.

Abstract: The present invention provides multi-well plates and column arrays in which samples (e.g., cell lysates containing nucleic acids of interest, such as RNA) can be analyzed and/or processed. In one embodiment, the microfiltration arrangement is a multilayer structure, including (i) a column plate having an array of minicolumns into which samples can be placed, (ii) a discrete filter element disposed in each minicolumn, (iii) a drip-director plate having a corresponding array of drip directors through which filtrate may egress, and (iv) a receiving-well plate having a corresponding array of receiving wells into which filtrate can flow. The invention provides multi-well microfiltration arrangements that are relatively simple to manufacture and that overcome many of the problems associated with the prior arrangements relating to (i) cross-contamination due to wicking across a common filter sheet or (ii) individual filter elements entrapping sample constituents within substantial dead volumes.

Abstract: The invention includes a filtration apparatus for processing a plurality of fluid samples into sample wells is provided. In one embodiment, the filtration apparatus includes a purification tray and a sample well tray with a plurality of sample wells. The purification tray includes a filter plate having a plurality of columns with discharge openings at the bottom thereof, at least one filter positioned in the columns of the filter plate for filtering the fluid samples as they pass therethrough, a heat plate positioned adjacent the columns of the filter plate, and a vent plate positioned below the heat plate. The heat plate is configured for transferring heat to the columns of the filter plate. The vent plate includes vents for permitting aerosols from the sample wells of the sample well tray to escape. A sample well tray with a plurality of the sample wells is positioned so that the sample wells align with the discharge openings of the filter plate columns to receive the liquid sample therein.

Abstract: The present invention provides multi-well plates and column arrays in which samples (e.g., cell lysates containing nucleic acids of interest, such as RNA) can be analyzed and/or processed. In one embodiment, the microfiltration arrangement is a multilayer structure, including (i) a column plate having an array of minicolumns into which samples can be placed, (ii) a discrete filter element disposed in each minicolumn, (iii) a drip-director plate having a corresponding array of drip directors through which filtrate may egress, and (iv) a receiving-well plate having a corresponding array of receiving wells into which filtrate can flow. The invention provides multi-well microfiltration arrangements that are relatively simple to manufacture and that overcome many of the problems associated with the prior arrangements relating to (i) cross-contamination due to wicking across a common filter sheet or (ii) individual filter elements entrapping sample constituents within substantial dead volumes.

Abstract: A polishing media magazine for improved polishing. The polishing media magazine may include a conditioning element for rapid, uniform conditioning and cleaning of the polishing media. The polishing media magazine may include polishing media having sections of raised elevation to contain the fluid and may include a polishing support platen having features adapted to urge the edges of the polishing media upwards. The polishing media may be roll fed from a supply roll across a support platen and onto a take-up roll.

Abstract: The present invention provides multi-well plates and column arrays in which samples (e.g., cell lysates containing nucleic acids of interest, such as RNA) can be analyzed and/or processed. In one embodiment, the microfiltration arrangement is a multilayer structure, including (i) a column plate having an array of minicolumns into which samples can be placed, (ii) a discrete filter element disposed in each minicolumn, (iii) a drip-director plate having a corresponding array of drip directors through which filtrate may egress, and (iv) a receiving-well plate having a corresponding array of receiving wells into which filtrate can flow. The invention provides multi-well microfiltration arrangements that are relatively simple to manufacture and that overcome many of the problems associated with is the prior arrangements relating to (i) cross-contamination due to wicking across a common filter sheet or (ii) individual filter elements entrapping sample constituents within substantial dead volumes.

Abstract: A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring.

Abstract: An apparatus for polishing wafers, preferably by chemical mechanical polishing. The apparatus includes a table defining a planar polishing surface adapted to contain a polishing medium and a wafer carrier assembly adapted to hold a wafer against the polishing surface. The wafer carrier assembly includes a wafer carrier and prevents rotation of the wafer carrier with respect to the polishing table even when the wafer carrier is moved in a circular or orbital path on the polishing surface. Polishing is carried out relative movement between the wafer carrier and the polishing surface in any direction within the plane of the polishing surface. The relative movement can be accomplished by moving the wafer carrier, the polishing table, or a combination of movements of the wafer carrier and polishing table.

Abstract: A collet system for mounting, holding, and rotating a rigid disk is described, the collet system including a collet and an expander, the collet having a base portion and fingers longitudinally extending therefrom, the fingers forming a disk contact ring opposite the base. The disk contact ring is less than the thickness of the disk to allow for full surface texturization of the disk. The disk contact ring is not coplanar with any locus of expansion contact points between the collet fingers and the expander, and is sufficiently distant therefrom such that the outward force exerted on the inner disk surface is determined by a cantilever spring deflection experienced by the fingers. This ensures substantially uniform and repeatable outward forces on the inner surface of the disk regardless of minor surface variations along the locus of expansion contact points.

Abstract: A method and apparatus is disclosed for polishing the face of a semiconductor wafer. The wafer is held in position by a tooling head and is contacted by an abrasive pad. A table is provided on to which the abrasive pad is fixedly attached, both of which move in directions parallel to the face of the wafer being polished. A controller controls the motion of the table according to a predetermined polishing pattern and is capable of maintaining a constant velocity between the wafer and the abrasive pad. The tooling head includes a circular platen and a retention ring peripherally oriented about the outer edge of the platen which resists lateral forces on the wafer caused by engagement of the face of the wafer with the polishing surface. An adjustable coupling is mounted to the platen and the ring, and serves to adjustably position during polishing the height of the ring relative to the face of the wafer as well as to rigidly support during polishing the position of the retaining ring.

Abstract: An apparatus and method is disclosed for texturizing magnetic storage disks in which the vibration due to forces imparted by oscillating motion is greatly decreased. Typically, the oscillating motion is caused by an oscillating spindle assembly which is slidably mounted on a base. The disclosed apparatus and method utilizes a counter-balance slidably mounted to the base which is caused to move in an opposite direction to the oscillating assembly. The apparatus uses a mechanical linkage which includes a yoke attached to the oscillating assembly, and a pulley and cable arrangement, attached to the counter-balance.

Abstract: A collet system for mounting, holding, and rotating a rigid disk substrate is described, the collet system including a collet and an expander, the collet having a base portion and fingers longitudinally extending therefrom. The inner surface of the disk is clamped by the radially expanding fingers at a location which is not coplanar with any locus of expansion contact points between the collet fingers and the expander. The outward radial force exerted on the inner disk surface is thereby determined by a cantilever spring tension experienced by the fingers, thus producing a highly consistent, repeatable force which is robust against small frictional variations in the environment and against small variations in inner diameters among disks. Inward axial movement of the expander into the collet is abuttably stopped at a predetermined offset for increased robustness, tolerance, and repeatability of results.