Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.

Abstract: In accordance with one embodiment of the present disclosure, an electrical discharge machine is provided comprising an EDM electrode, an electrode holder, and an electrode guide. The electrode guide comprises an internal passage profile that transitions along the machining axis from a substantially circular cross section comprising a diameter d2 to an apexed cross section. The EDM electrode extends from the electrode holder through the electrode entrance aperture of the electrode guide and out of the electrode exit aperture of the electrode guide. The apexed cross section of the electrode guide is aligned relative to the circular cross section of the electrode guide such that apexes of the electrode exit aperture lie outside of a circumferential portion of the circular cross section. A restricted circumferential portion defined by the apexed cross section comprises a diameter that is greater than the effective electrode diameter. Additional embodiments are disclosed.

Abstract: A silicon-based showerhead electrode is provided that can include a backside, a frontside, and a plurality of showerhead passages extending from the backside of the silicon-based showerhead electrode to the frontside of the silicon-based showerhead electrode. The silicon-based showerhead electrode can comprise single crystal silicon. The silicon-based showerhead electrode may further include a plurality of partial recesses formed within the single crystal silicon along the backside of the silicon-based showerhead electrode. The plurality of partial recesses can leave a thickness of single crystal silicon between each of the partial recesses and the frontside of the silicon-based showerhead electrode.

Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.

Abstract: The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body.

Abstract: In accordance with one embodiment of the present disclosure, an electrical discharge machine is provided comprising an EDM electrode, an electrode holder, and an electrode guide. The electrode guide comprises an internal passage profile that transitions along the machining axis from a substantially circular cross section comprising a diameter d2 to an apexed cross section. The EDM electrode extends from the electrode holder through the electrode entrance aperture of the electrode guide and out of the electrode exit aperture of the electrode guide. The apexed cross section of the electrode guide is aligned relative to the circular cross section of the electrode guide such that apexes of the electrode exit aperture lie outside of a circumferential portion of the circular cross section. A restricted circumferential portion defined by the apexed cross section comprises a diameter that is greater than the effective electrode diameter. Additional embodiments are disclosed and claimed.

Abstract: The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body.

Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts.