Patents by Inventor Jon McChesney
Jon McChesney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11887819Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: GrantFiled: October 5, 2022Date of Patent: January 30, 2024Assignee: Lam Research CorporationInventors: Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, Alexander Miller Paterson, John Holland
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Patent number: 11692732Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.Type: GrantFiled: June 23, 2020Date of Patent: July 4, 2023Assignee: Lam Research CorporationInventors: Saravanapriyan Sriraman, John Drewery, Jon McChesney, Alex Paterson
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Patent number: 11605546Abstract: A substrate processing system includes a processing chamber. A pedestal is arranged in the processing chamber. An edge coupling ring is arranged adjacent to the pedestal and around a radially outer edge of the substrate. An actuator is configured to selectively move a first portion of the edge coupling ring relative to the substrate to alter an edge coupling profile of the edge coupling ring.Type: GrantFiled: January 16, 2015Date of Patent: March 14, 2023Assignee: Lam Research CorporationInventors: Jon McChesney, Alex Paterson
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Publication number: 20230039721Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: ApplicationFiled: October 5, 2022Publication date: February 9, 2023Inventors: Jon MCCHESNEY, Saravanapriyan SRIRAMAN, Richard A. MARSH, Alexander Miller PATERSON, John HOLLAND
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Patent number: 11495441Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: GrantFiled: October 29, 2020Date of Patent: November 8, 2022Assignee: Lam Research CorporationInventors: Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, Alexander Miller Paterson, John Holland
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Publication number: 20220189745Abstract: A bottom ring is configured to support a moveable edge ring that is configured to be raised and lowered relative to a substrate support. The bottom ring includes an upper surface that is stepped, an annular inner diameter, an annular outer diameter, a lower surface, a plurality of vertical guide channels provided through the bottom ring from the lower surface to the upper surface of the bottom ring, each of the guide channels including a first region having a smaller diameter than the guide channel and being configured to receive respective lift pins for raising and lowering the edge ring, and a guide feature extending upward from the upper surface of the bottom ring.Type: ApplicationFiled: February 25, 2022Publication date: June 16, 2022Inventors: Hiran Rajitha RATHNASINGHE, Shawn TOKAIRIN, Jon MCCHESNEY
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Publication number: 20220189744Abstract: A middle ring configured to be arranged on a bottom ring and to support a moveable edge ring and further configured to be raised and lowered relative to a substrate support includes an upper surface that is stepped, an annular inner diameter, an annular outer diameter, a lower surface, a guide feature in the upper surface defining the annular outer diameter, an inner annular rim in the upper surface defining the annular inner diameter, and a groove defined in the upper surface between the guide feature and the inner annular rim.Type: ApplicationFiled: February 25, 2022Publication date: June 16, 2022Inventors: Hiran Rajitha RATHNASINGHE, Shawn TOKAIRIN, Jon MCCHESNEY
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Publication number: 20210183687Abstract: An edge ring arrangement for a processing chamber includes a first ring configured to surround and overlap a radially outer edge of an upper plate of a pedestal arranged in the processing chamber, a second ring arranged below the first moveable ring, wherein a portion of the first ring overlaps the second ring, a first actuator configured to actuate a first pillar to selectively move the first ring to a raised position and a lowered position relative to the pedestal, and a second actuator configured to actuate a second pillar to selectively move the second ring to a raised position and a lowered position relative to the pedestal.Type: ApplicationFiled: February 22, 2021Publication date: June 17, 2021Inventors: Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney, Alex Paterson
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Patent number: 11011353Abstract: A substrate support in a substrate processing system includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller. The controller at least one of raises the edge ring to selectively cause the edge ring to engage the substrate and lowers the inner portion to selectively cause the edge ring to engage the substrate. The controller determines when the edge ring engages the substrate and calculates at least one characteristic of the substrate processing system based on the determination of when the edge ring engages the substrate.Type: GrantFiled: January 11, 2017Date of Patent: May 18, 2021Assignee: Lam Research CorporationInventors: Marcus Musselman, Andrew D. Bailey, III, Jon McChesney
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Patent number: 10957521Abstract: A system includes an image processing module configured to receive an image, captured by an imaging device, of a plasma environment within a substrate processing chamber during processing of a substrate and extract one or more features of the image indicative of a plasma sheath formed within the plasma environment during the processing of the substrate. A control module is configured to determine a plasma sheath profile based on the one or more features extracted from the image and selectively adjust at least one processing parameter related to the processing of the substrate based on the plasma sheath profile.Type: GrantFiled: May 29, 2018Date of Patent: March 23, 2021Assignee: Lam Research CorporationInventors: Yuhou Wang, Michael John Martin, Jon Mcchesney, Alexander Miller Paterson
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Publication number: 20210050188Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: ApplicationFiled: October 29, 2020Publication date: February 18, 2021Inventors: Jon MCCHESNEY, Saravanapriyan SRIRAMAN, Richard A. MARSH, Alexander Miller PATERSON, John HOLLAND
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Patent number: 10825661Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.Type: GrantFiled: May 2, 2018Date of Patent: November 3, 2020Assignee: Lam Research CorporationInventors: Jon McChesney, Saravanapriyan Sriraman, Richard A. Marsh, Alexander Miller Paterson, John Holland
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Publication number: 20200318852Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.Type: ApplicationFiled: June 23, 2020Publication date: October 8, 2020Inventors: Saravanapriyan Sriraman, John Drewery, Jon McChesney, Alex Paterson
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Publication number: 20200312633Abstract: A bottom ring is configured to support a moveable edge ring. The edge ring is configured to be raised and lowered relative to a substrate support. The bottom ring includes an upper surface that is stepped, an annular inner diameter, an annular outer diameter, a lower surface, and a plurality of vertical guide channels provided through the bottom ring from the lower surface to the upper surface of the bottom ring. Each of the guide channels includes a first region having a smaller diameter than the guide channel, and the guide channels are configured to receive respective lift pins for raising and lowering the edge ring.Type: ApplicationFiled: November 21, 2017Publication date: October 1, 2020Inventors: Hiran Rajitha RATHNASINGHE, Shawn E S TOKAIRIN, Jon MCCHESNEY
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Patent number: 10770339Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module.Type: GrantFiled: April 29, 2019Date of Patent: September 8, 2020Assignee: Lam Research CorporationInventors: Damon Tyrone Genetti, Jon McChesney, Alex Paterson, Derek John Witkowicki, Austin Ngo
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Patent number: 10690374Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.Type: GrantFiled: January 31, 2018Date of Patent: June 23, 2020Assignee: Lam Research CorporationInventors: Saravanapriyan Sriraman, John Drewery, Jon McChesney, Alex Paterson
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Patent number: 10658222Abstract: A substrate processing system includes a processing chamber and a pedestal arranged in the processing chamber. An edge coupling ring is arranged adjacent to a radially outer edge of the pedestal. A first actuator is configured to selectively move the edge coupling ring to a raised position, relative to the pedestal to provide clearance between the edge coupling ring and the pedestal to allow a robot arm to remove the edge coupling ring from the processing chamber.Type: GrantFiled: May 6, 2015Date of Patent: May 19, 2020Assignee: LAM RESEARCH CORPORATIONInventors: Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney, Alex Paterson
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Patent number: 10651013Abstract: Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple states. Such a reduction in the reflected power increases a life of a radio frequency generator coupled to the impedance matching circuit while simultaneously processing a substrate using the multiple states.Type: GrantFiled: August 15, 2019Date of Patent: May 12, 2020Assignee: Lam Research CorporationInventors: Jon McChesney, Alexander Paterson
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Patent number: 10600620Abstract: Systems, methods, and computer programs are presented for controlling the temperature of a window in a semiconductor manufacturing chamber. One apparatus includes a heater for receiving and heating a flow of air and an air amplifier coupled to pressurized gas. The air amplifier has an input that receives the flow of air from the heater, and the air amplifier having an output. A duct is coupled to the output of the air amplifier and a plenum is coupled to the duct. The plenum receives the flow of air and distributes the flow of air over a window of a plasma chamber. A temperature sensor is situated about the window of the plasma chamber and a controller is provided to control the air amplifier and the heater based on a temperature measured by the temperature sensor.Type: GrantFiled: December 19, 2016Date of Patent: March 24, 2020Assignee: Lam Research CorporationInventors: Jon McChesney, Alex Paterson
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Patent number: 10541168Abstract: A system for determining an alignment of an edge ring on a substrate support includes a robot control module configured to control a robot to place the edge ring onto the substrate support and retrieve the edge ring from the substrate support. An alignment module is configured to determine a plurality of first positions of the edge ring on the robot prior to being placed onto the substrate support and determine a plurality of second positions of the edge ring on the robot subsequent to being retrieved from the substrate support. An edge ring position module configured to determine a centered position of the edge ring relative to the substrate support based on offsets between the plurality of first positions and the plurality of second positions.Type: GrantFiled: October 31, 2017Date of Patent: January 21, 2020Assignee: LAM RESEARCH CORPORATIONInventors: Ali Sucipto Tan, Haoquan Yan, Marc Estoque, Damon Tyrone Genetti, Jon McChesney, Alexander Miller Paterson