Patents by Inventor Jon Michael HEON

Jon Michael HEON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Submicron particle removal from gas streams
    Patent number: 10730002
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: August 4, 2020
    Assignee: Stamicarbon B.V.
    Inventors: Brian Sayre Higgins, John Marshall Tate, III, Robert Arthur Yates, Marcel Julien Pomerleau, Jon Michael Heon, Wilfried Marc Renaat Dirkx, Juan Coloma González
  • Submicron particle removal from gas streams
    Patent number: 10722831
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: July 28, 2020
    Assignee: Stamicarbon B.V.
    Inventors: Brian Sayre Higgins, John Marshall Tate, III, Robert Arthur Yates, Marcel Julien Pomerleau, Jon Michael Heon, Wilfried Marc Renatt Dirkx, Juan Coloma González
  • SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
    Publication number: 20190388823
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
    Type: Application
    Filed: September 6, 2019
    Publication date: December 26, 2019
    Applicant: Stamicarbon B.V.
    Inventors: Brian Sayre HIGGINS, John Marshall TATE, III, Robert Arthur YATES, Marcel Julien POMERLEAU, Jon Michael HEON, Wilfried Marc Renatt DIRKX, Juan Coloma GONZÁLEZ
  • Submicron particle removal from gas streams
    Patent number: 10500535
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: December 10, 2019
    Assignee: Stamicarbon B.V.
    Inventors: Brian Sayre Higgins, John Marshall Tate, III, Robert Arthur Yates, Marcel Julien Pomerleau, Jon Michael Heon, Wilfried Marc Renaat Dirkx, Juan Coloma González
  • SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
    Publication number: 20190224610
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 2 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h). The disclosure also pertains to a prilling tower having a gas stream treatment system comprising a Venturi ejector at the top of the prilling tower, and to a method of modifying an existing prilling tower.
    Type: Application
    Filed: May 9, 2017
    Publication date: July 25, 2019
    Applicant: Stamicarbon B.V.
    Inventors: Brian Sayre HIGGINS, John Marshall TATE, III, Robert Arthur YATES, Marcel Julien POMERLEAU, Jon Michael HEON, Wilfried Marc Renaat DIRKX, Juan Coloma González
  • SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
    Publication number: 20170320816
    Abstract: Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m3/h)/(m3/h).
    Type: Application
    Filed: April 24, 2017
    Publication date: November 9, 2017
    Applicant: Stamicarbon B.V.
    Inventors: Brian Sayre HIGGINS, John Marshall TATE, III, Robert Arthur YATES, Marcel Julien POMERLEAU, Jon Michael HEON, Wilfried Marc Renaat DIRKX, Juan Coloma GONZÁLEZ