Patents by Inventor Jon Opsal

Jon Opsal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8817260
    Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.
    Type: Grant
    Filed: November 11, 2009
    Date of Patent: August 26, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Lena Nicolaides, Alex Salnik, Allan Rosencwaig
  • Patent number: 8049903
    Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: November 1, 2011
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Ilya Grodnensky, Heath Pois
  • Publication number: 20110205554
    Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.
    Type: Application
    Filed: March 28, 2011
    Publication date: August 25, 2011
    Applicant: KLA-Tencor Corporation
    Inventors: Jon OPSAL, Ilya Grodnensky, Heath Pois
  • Patent number: 7982867
    Abstract: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.
    Type: Grant
    Filed: April 26, 2010
    Date of Patent: July 19, 2011
    Assignee: KLA-Tencor Corporation
    Inventors: Alex Salnik, Jon Opsal, Lena Nicolaides
  • Patent number: 7933026
    Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.
    Type: Grant
    Filed: June 18, 2009
    Date of Patent: April 26, 2011
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Ilya Grodnensky, Heath Pois
  • Publication number: 20100315625
    Abstract: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.
    Type: Application
    Filed: April 26, 2010
    Publication date: December 16, 2010
    Applicant: KLA-TENCOR CORPORATION
    Inventors: Alex SALNIK, Jon Opsal, Lena Nicolaides
  • Patent number: 7747424
    Abstract: A modeling approach is disclosed which addresses samples with different regions where the structures exhibit different periodicities. In this approach, a first partial model is generated which defines the shape, material properties and periodicity of the first region. In addition, a second partial model is generated defining the shape, material properties and periodicity of the second region. These two partial models are then merged into a combined model. When optimizing the combined model, the shape and material properties of the first and second models are independently adjusted. The optical responses of the model with differing shapes and material properties are-calculated and compared to a physical sample. This process is iteratively carried out to derive a final combined model that corresponds to a physical sample.
    Type: Grant
    Filed: March 8, 2007
    Date of Patent: June 29, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Jingmin Leng
  • Publication number: 20100134785
    Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.
    Type: Application
    Filed: November 11, 2009
    Publication date: June 3, 2010
    Applicant: KLA-Tencor Corp.
    Inventors: Jon Opsal, Lena Nicolaides, Alex Salnik, Allan Rosencwaig
  • Patent number: 7705977
    Abstract: Methods of obtaining dopant and damage depth profile information are disclosed using modulated optical reflectivity (MOR) measurements. In one aspect, the depth profile is constructed using information obtained from various measurements such as the junction depth, junction abruptness and dopant concentration. In another aspect, a full theoretical model is developed. Actual measurements are fed to the model. Using an iterative approach, the actual measurements are compared to theoretical measurements calculated from the model to determine the actual depth profile.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: April 27, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Alex Salnik, Jon Opsal, Lena Nicolaides
  • Patent number: 7667841
    Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.
    Type: Grant
    Filed: October 20, 2008
    Date of Patent: February 23, 2010
    Assignee: KLA-Tencor Corporation
    Inventor: Jon Opsal
  • Patent number: 7646486
    Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: January 12, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Lena Nicolaides, Alex Salnik, Allan Rosencwaig
  • Patent number: 7619741
    Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: November 17, 2009
    Assignee: KLA-Tencor Corp.
    Inventors: Lena Nicolaides, Jeffrey T. Fanton, Alex Salnik, Jon Opsal
  • Patent number: 7613598
    Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: November 3, 2009
    Assignee: KLA-Tencor Corp.
    Inventors: Jon Opsal, Hanyou Chu, Xuelong Cao, Youxian Wen
  • Publication number: 20090259605
    Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.
    Type: Application
    Filed: June 18, 2009
    Publication date: October 15, 2009
    Applicant: KLA Tencor Corporation
    Inventors: Jon Opsal, Ilya Grodnensky, Heath Pois
  • Patent number: 7567351
    Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.
    Type: Grant
    Filed: January 24, 2007
    Date of Patent: July 28, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Jon Opsal, Ilya Grodnensky, Heath Pois
  • Publication number: 20090066954
    Abstract: An apparatus is disclosed for obtaining ellipsometric measurements from a sample. A probe beam is focused onto the sample to create a spread of angles of incidence. The beam is passed through a quarter waveplate retarder and a polarizer. The reflected beam is measured by a detector. In one preferred embodiment, the detector includes eight radially arranged segments, each segment generating an output which represents an integration of multiple angle of incidence. A processor manipulates the output from the various segments to derive ellipsometric information.
    Type: Application
    Filed: October 20, 2008
    Publication date: March 12, 2009
    Inventor: Jon Opsal
  • Patent number: 7502104
    Abstract: The present invention provides a probe beam profile—modulated optical reflectivity metrology system having a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample in a manner so that the rays within the probe beam create a spread of angles of incidence. A detector array simultaneously measures intensities of the rays within the reflected/diffracted probe beam simultaneously at different angles of incidence. The intensity and angle of incidence information is used to analyze the sample.
    Type: Grant
    Filed: August 6, 2007
    Date of Patent: March 10, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Alex Salnik, Lena Nicolaides, Jon Opsal
  • Patent number: 7499168
    Abstract: A metrology tool for semiconductor wafers is disclosed which combines modulated reflectivity measurement with junction photovoltage measurements. The tool includes an intensity modulated pump beam for periodically exciting the sample. A separate probe beam is used to monitor changes in optical reflectivity of the sample. In addition, capacitive electrodes are provided to measure modulated changes in the voltage across the electrodes. These measurements are combined to evaluate the wafer. These measurement can be particularly useful in characterizing ultrashallow junctions.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: March 3, 2009
    Assignee: KLA-Tencor Corp.
    Inventors: Alex Salnik, Lena Nicolaides, Jon Opsal
  • Patent number: 7478019
    Abstract: Measurement data sets for optical metrology systems can be processed in parallel using Multiple Tool and Structure Analysis (MTSA). In an MTSA procedure, at least one parameter that is common to the data sets can be coupled as a global parameter. Setting this parameter as global allows a regression on each data set to contain fewer fitting parameters, making the process is less complex, requiring less processing capacity, and providing more accurate results. MTSA can analyze multiple structures measured on a single tool, or a single structure measured on separate tools. For a multiple tool recipe, a minimized regression solution can be applied back to each tool to determine whether the recipe is optimized. If the recipe does not provide accurate results for each tool, search parameters and/or spaces can be modified in an iterative manner until an optimized solution is obtained that provides acceptable solutions on each tool.
    Type: Grant
    Filed: January 26, 2005
    Date of Patent: January 13, 2009
    Assignee: KLA-Tencor Corporation
    Inventors: Shahin Zangooie, Youxian Wen, Heath Pois, Jon Opsal
  • Publication number: 20080309943
    Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
    Type: Application
    Filed: August 4, 2008
    Publication date: December 18, 2008
    Inventors: Lena Nicolaides, Jeffrey T. Fanton, Alex Salnik, Jon Opsal