Patents by Inventor Jon R. Phillips

Jon R. Phillips has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for high precision isotope ratio destructive analysis
    Patent number: 8477304
    Abstract: A system and process are disclosed that provide high accuracy and high precision destructive analysis measurements for isotope ratio determination of relative isotope abundance distributions in liquids, solids, and particulate samples. The invention utilizes a collinear probe beam to interrogate a laser ablated plume. This invention provides enhanced single-shot detection sensitivity approaching the femtogram range, and isotope ratios that can be determined at approximately 1% or better precision and accuracy (relative standard deviation).
    Type: Grant
    Filed: March 17, 2011
    Date of Patent: July 2, 2013
    Assignee: Battelle Memorial Institute
    Inventors: Bruce A. Bushaw, Norman C. Anheier, Jon R. Phillips
  • SYSTEM AND METHOD FOR HIGH PRECISION ISOTOPE RATIO DESTRUCTIVE ANALYSIS
    Publication number: 20110164248
    Abstract: A system and process are disclosed that provide high accuracy and high precision destructive analysis measurements for isotope ratio determination of relative isotope abundance distributions in liquids, solids, and particulate samples. The invention utilizes a collinear probe beam to interrogate a laser ablated plume. This invention provides enhanced single-shot detection sensitivity approaching the femtogram range, and isotope ratios that can be determined at approximately 1% or better precision and accuracy (relative standard deviation).
    Type: Application
    Filed: March 17, 2011
    Publication date: July 7, 2011
    Applicant: BATTELLE MEMORIAL INSTITUTE
    Inventors: Bruce A. Bushaw, Norman C. Anheier, JR., Jon R. Phillips