Patents by Inventor Jon Reese

Jon Reese has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110035330
    Abstract: Described are methods and apparatuses, including computer program products, for quality control of investment performance calculations. Performance data associated with one or more investment accounts is received by a server computing device. A tolerance range associated with the performance data is generated. A portion of the performance data is identified for filtering based on the tolerance range. The identified performance data is processed through a plurality of filters, wherein the filters are based on predefined rules. A first portion of the filtered data is marked as requiring no further review. A second portion of the filtered data is marked as requiring further review.
    Type: Application
    Filed: August 7, 2009
    Publication date: February 10, 2011
    Applicant: FMR LLC
    Inventors: Francis Li, Stephen Dorato, Nixon Lim, Jon Reese
  • Patent number: 4861419
    Abstract: Operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end point trace is defined (62) for the etch process. Regions are defined in the reference end point trace (70) with aid of a dynamic time warping matching function (84) and characteristics and tolerances for each region are defined (72-80). The etcher is run and an actual end point trace is obtained (82) from the running of the etcher. A warping function is constructed (88) between the actual trace and the reference trace. In building the warping function, candidate path segments (100) are constructed according to a minimum cumulative cost function (96). Once the regions of the reference trace and the actual trace has been matched according to an optimum dynamic time warping function path (106), characteristics of the matched regions are compared (66) to determine whether aberrations have occurred during the etch process.
    Type: Grant
    Filed: August 15, 1988
    Date of Patent: August 29, 1989
    Assignee: Texas Instruments Incorporated
    Inventors: Bruce E. Flinchbaugh, Steven B. Dolins, Aditya Srivastava, Jon Reese