Patents by Inventor Jonas GERTSCH

Jonas GERTSCH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRON-ENHANCED METAL OXIDE ATOMIC LAYER DEPOSITION
    Publication number: 20250257457
    Abstract: A method for forming a metal oxide insulating film includes conducting electron-enhanced atomic layer deposition with at least one metal-containing precursor gas and at least one oxygen-containing precursor gas as reactants to deposit a metal oxide insulating film on a substrate. The metal oxide can be SiO2, TiO2, HfO2, or ZrO2. A particular method for forming a SiO2 film includes conducting electron-enhanced atomic layer deposition with at least one silicon-containing precursor gas and at least one oxygen-containing precursor gas as reactants to deposit a SiO2 film on a substrate, wherein the electron-enhanced atomic layer deposition is conducted at a temperature of less than 300° C. A SiO2 film produced by the method can be a blanket film or a patterned structure.
    Type: Application
    Filed: June 18, 2024
    Publication date: August 14, 2025
    Applicants: SAMSUNG ELECTRONICS CO., LTD., THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE
    Inventors: Steven GEORGE, Jonas GERTSCH, Zachary SOBELL, Harsono SIMKA
  • Atomic layer etching on microdevices and nanodevices
    Patent number: 11565936
    Abstract: The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: January 31, 2023
    Assignees: The Regents of the University of Colorado, DRS Network & Imaging Systems, LLC
    Inventors: Steven M. George, Victor M. Bright, Joseph J. Brown, Jonas Gertsch, Nathan Thomas Eigenfeld, George Skidmore
  • ATOMIC LAYER ETCHING ON MICRODEVICES AND NANODEVICES
    Publication number: 20200316645
    Abstract: The present invention relates to the unexpected discovery of novel methods of preparing nanodevices and/or microdevices with predetermined patterns. In one aspect, the methods of the invention allow for engineering structures and films with continuous thickness equal to or less than 50 nm.
    Type: Application
    Filed: May 25, 2017
    Publication date: October 8, 2020
    Applicants: The Regents of the University of Colorado, a Body Corporate, DRS Network & Imaging Systems, LLC
    Inventors: Steven M. GEORGE, Victor M. BRIGHT, Joseph J. BROWN, Jonas GERTSCH, Nathan Thomas EIGENFELD, George SKIDMORE