Patents by Inventor Jonathan C. Morgan
Jonathan C. Morgan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11963727Abstract: Mitigating a user interface display function of a modular energy system includes receiving formatted video data at a video data converter circuit, providing differential video signaling data to the display from the video data converter circuit, providing a copy of the differential video signaling data to a processor, and determining that the differential video signaling data is changing over time. Mitigating erroneous outputs from an isolated interface includes receiving a state of a first switch of a first footswitch coupled to a first comparator and a reference voltage coupled to the first comparator, receiving the state of the first switch coupled to the first duplicate comparator and the reference voltage coupled to the first duplicate comparator, comparing the output of the first comparator with the output of the first duplicate comparator, and determining activation or deactivation of a surgical instrument coupled to the controller based on the comparison.Type: GrantFiled: March 30, 2021Date of Patent: April 23, 2024Assignee: Cilag GmbH InternationalInventors: Joshua P. Morgan, Andrew W. Carroll, Jeffrey L. Aldridge, Joshua M. Henderson, James M. Vachon, Eitan T. Wiener, Daniel C. Herman, Jonathan T. Samuel, Jeffrey A. Bullock
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Publication number: 20040211514Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: ApplicationFiled: May 17, 2004Publication date: October 28, 2004Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Publication number: 20040194883Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: ApplicationFiled: April 22, 2004Publication date: October 7, 2004Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Patent number: 6758938Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: GrantFiled: August 31, 1999Date of Patent: July 6, 2004Assignee: Micron Technology, Inc.Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Patent number: 6645874Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: GrantFiled: May 24, 2001Date of Patent: November 11, 2003Assignee: Micron Technology, Inc.Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Publication number: 20030196678Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: ApplicationFiled: May 24, 2001Publication date: October 23, 2003Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Publication number: 20010037816Abstract: An apparatus and method for delivering ozone to a workpiece. In one embodiment, fluid is sprayed onto a workpiece placed in an ozone-rich environment. Alternatively, ozone is mixed with the fluid prior to spraying the fluid onto the workpiece. When spraying the fluid, the invention pulses the fluid at desired rates to create a substantially uniform layer of ozone-rich fluid on the workpiece. In another embodiment, the workpiece is also slowly rotated during at least a portion of the time the layer of ozone-rich fluid is applied to the workpiece.Type: ApplicationFiled: May 25, 2001Publication date: November 8, 2001Inventors: Kevin J. Torek, Jonathan C. Morgan, Paul A. Morgan
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Patent number: 6017827Abstract: The present invention generally provides a physical system and method for mixing a gas in a solvent to produce a solution used in the processing of a semiconductor work object. To dissolve a desired gas into a desired solvent, the solvent and gas are introduced into a pressurizable mixing module. The mixing module is selectably in communication with a process vessel. A pressure control mechanism, such as a valve, is located downstream of the mixing module to regulate the pressure and flow of solution or fluid in and leaving the mixing module to the process vessel. Preferably, the pressure control mechanism is located downstream and in communication with the process vessel. By adjusting the level of restriction of the pressure control mechanism the pressure of the gas in the mixing vessel above the solvent may be positively or negatively affected to vary the concentration of gas in solution based on Henry's Law.Type: GrantFiled: May 4, 1998Date of Patent: January 25, 2000Assignee: Micron Technology, Inc.Inventors: Paul A. Morgan, Jonathan C. Morgan
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Patent number: 5785875Abstract: Disclosed is a method for the removal of a layer of photoresist material from a surface of a film located on an in-process integrated circuit wafer subsequent to etching the film through the photoresist material layer. The method disclosed herein comprises first, applying a layer of the photoresist material layer over the film, then patterning the photoresist material, etching the film, and finally, removing the photoresist material. The etch is preferably a wet etch conducted in a closed reaction chamber. The photoresist material removal can be conducted within the same closed reaction chamber as that in which the etch was conducted. Photoresist material removal is achieved by exposing the photoresist material to heated solvent vapors. One particularly advantageous vapor solvent comprises isopropyl alcohol. Subsequent to the photoresist material removal, the film is preferably subjected to cleaning, rinsing, and drying methods, all of which can be conducted within the same closed reaction chamber.Type: GrantFiled: February 13, 1996Date of Patent: July 28, 1998Assignee: Micron Technology, Inc.Inventors: Richard C. Hawthorne, Jonathan C. Morgan, Li Li