Abstract: A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. A controlled radical polymerization method is disclosed to make the low surface tension block copolymers. The method includes the steps of sequentially adding a first monomer composition that is free of hydroxyl groups and amine groups and a second monomer composition that includes the low surface tension monomer to a suitable atom transfer radical polymerization initiator and polymerizing the monomer compositions to form a block copolymer.

Abstract: A thermosetting composition that includes a first reactant having functional groups; a second reactant having functional groups coreactive with the functional groups of the first reactant; and a block copolymer flow control agent. The block copolymer includes a first block made up of residues of a radically polymerizable fluoroalkyl(meth)acrylate monomer, a second block made up of residues of a second radically polymerizable ethylenically unsaturated monomer, and optionally a third block made up of residues of a third radically polymerizable ethylenically unsaturated monomer. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. Also disclosed is a method of coating a substrate including the steps of applying the present thermosetting composition to the substrate; coalescing the thermosetting composition to form a substantially continuous film; and curing said thermosetting composition by the application of heat.

Abstract: A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. A controlled radical polymerization method is disclosed to make the low surface tension block copolymers. The method includes the steps of sequentially adding a first monomer composition that is free of hydroxyl groups and amine groups and a second monomer composition that includes the low surface tension monomer to a suitable atom transfer radical polymerization initiator and polymerizing the monomer compositions to form a block copolymer.

Abstract: A thermosetting composition that includes a first reactant having functional groups; a second reactant having functional groups coreactive with the functional groups of the first reactant; and a block copolymer flow control agent. The block copolymer includes a first block made up of residues of a radically polymerizable fluoroalkyl (meth)acrylate monomer, a second block made up of residues of a second radically polymerizable ethylenically unsaturated monomer, and optionally a third block made up of residues of a third radically polymerizable ethylenically unsaturated monomer. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. Also disclosed is a method of coating a substrate including the steps of applying the present thermosetting composition to the substrate; coalescing the thermosetting composition to form a substantially continuous film; and curing said thermosetting composition by the application of heat.

Abstract: Block copolymers containing at least two blocks are provided and comprise: (a) a first block containing residues of at least one first ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e.g., 2-ethylhexyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer, e.g., hydroxypropyl methacrylate; and (b) a second block containing residues of at least one second ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality, e.g., iso-butyl methacrylate, and a minor amount of at least one hydroxy functional ethylenically unsaturated radically polymerizable monomer. The calculated Tg of the second monomer of the block copolymer is at least 20° C. greater than the calculated Tg of the first monomer.

Abstract: Thermosetting coating compositions, e.g., powder coating compositions, are provided and comprise: (a) a first reactant having functional groups, e.g., an epoxide functional (meth)acrylic polymer; (b) a second reactant having functional groups that are co-reactive with the functional groups of the first reactant, e.g., a carboxylic acid functional crosslinking agent; and (c) a polymeric flow control agent. The flow control agent is a block copolymer prepared by controlled radical polymerization and comprises: (i) a first block containing residues of at least one first ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality; and (ii) a second block containing residues of at least one second ethylenically unsaturated radically polymerizable monomer that is free of hydroxy functionality. The second monomer of the flow control agent has a calculated Tg of at least 20° C. greater than that of the first monomer.

Abstract: An electrodepositable photoresist composition for producing non-tacky films on an electroconductive substrate comprises an aqueous dispersion of a water-dispersible photosensitive ionic polymeric material and a polyalkylene oxide-modified polysiloxane sufficient to give slip and blocking properties that enables direct placement of a photomask on the resultant dehydrated film. The composition also preferably contains a nonionic unsaturated material and a photoinitiator.