Patents by Inventor Jonathan H. Feroce
Jonathan H. Feroce has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8446570Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: September 15, 2010Date of Patent: May 21, 2013Assignee: ASML Holding N.V.Inventors: Santiago Del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20130010277Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Patent number: 7869003Abstract: A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.Type: GrantFiled: July 12, 2006Date of Patent: January 11, 2011Assignee: ASML Holding NVInventors: Matthew J. Van Doren, Jonathan H. Feroce
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Publication number: 20110001955Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: September 15, 2010Publication date: January 6, 2011Applicant: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 7830497Abstract: Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: April 18, 2007Date of Patent: November 9, 2010Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olsen, Jonathan H. Feroce
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Publication number: 20080014508Abstract: A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.Type: ApplicationFiled: July 12, 2006Publication date: January 17, 2008Applicant: ASML Holding N.V.Inventors: Matthew J. Van Doren, Jonathan H. Feroce
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Patent number: 7304720Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.Type: GrantFiled: February 20, 2003Date of Patent: December 4, 2007Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Eric R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 7209220Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: December 13, 2005Date of Patent: April 24, 2007Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Patent number: 6906783Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: GrantFiled: February 20, 2003Date of Patent: June 14, 2005Assignee: ASML Holding N.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20030227605Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.Type: ApplicationFiled: February 20, 2003Publication date: December 11, 2003Applicant: ASML Netherlands B.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce
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Publication number: 20030218728Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The reticle and cover are moved to a stage using a robot gripper. The reticle and cover may be coupled to a baseplate before being moved. Corresponding alignment devices are coupled to the frame and the panel, the gripper and the panel, and the baseplate and the panel. The stage and the frame can have corresponding attachment devices. A pre-alignment device can be used to align the reticle before transporting it to a stage. The pre-alignment device and the frame can have corresponding alignment devices that can be used to perform the pre-alignment. Predetermined areas of the reticle can be hardened or shaped, such that less particles are produced during contact with the reticle.Type: ApplicationFiled: February 20, 2003Publication date: November 27, 2003Applicant: ASML Netherlands B.V.Inventors: Santiago del Puerto, Erik R. Loopstra, Andrew Massar, Duane P. Kish, Abdullah Alikhan, Woodrow J. Olson, Jonathan H. Feroce