Patents by Inventor Jonathan Hander

Jonathan Hander has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9988735
    Abstract: An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: June 5, 2018
    Assignee: TEL NEXX, INC.
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, Jonathan Hander, Johannes Chiu, David G. Guarnaccia, Daniel L. Goodman
  • Publication number: 20170370017
    Abstract: An electrochemical deposition system having two or more electrochemical deposition modules arranged on a common platform and configured for depositing one or more metals on a substrate is described. Each electrochemical deposition module includes an anode compartment configured to contain a volume of anolyte fluid, a cathode compartment configured to contain a volume of catholyte fluid, and a membrane separating the anode compartment from the cathode compartment. Each electrochemical deposition module further includes a workpiece holder configured to hold opposing edges of a flexible workpiece between first and second leg members via a clamping mechanism, and a loader module configured to position the flexible workpiece in the workpiece holder while holding the flexible workpiece using an air cushion on each opposing planar surface of the flexible workpiece.
    Type: Application
    Filed: June 27, 2016
    Publication date: December 28, 2017
    Inventors: Arthur Keigler, Jonathan Hander, Freeman Fisher, Jonathan Haynes, Gary Boulet, David G. Guarnaccia
  • Patent number: 9637836
    Abstract: An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
    Type: Grant
    Filed: July 1, 2014
    Date of Patent: May 2, 2017
    Assignee: TEL NEXX, INC.
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, Jonathan Hander, Johannes Chiu, David G. Guarnaccia, Daniel L. Goodman
  • Patent number: 9303329
    Abstract: Techniques disclosed herein include an electro-chemical deposition apparatus that provides an efficient circulation system, chemical management that provides reliable and uniform plating, and a configuration that provides short maintenance times and greater tool availability. Techniques include a processing tank containing an anolyte fluid, and one or more plating cells each having a catholyte fluid compartment with a circulation path that connects to a separate or remote catholyte reservoir. Thus, with such a configuration, a single pump can be used to flow catholyte (via manifolds) through one or more plating cells. Thus, with the catholyte reservoir maintained off board, instead of dumping catholyte over a weir into a reservoir, catholyte fluid—after flowing through a plating cell—is returned to the catholyte reservoir.
    Type: Grant
    Filed: November 11, 2013
    Date of Patent: April 5, 2016
    Assignee: TEL NEXX, INC.
    Inventors: Arthur Keigler, David Guarnaccia, Demetrius Papapanayiotou, Jonathan Hander
  • Publication number: 20150129418
    Abstract: Techniques disclosed herein include an electro-chemical deposition apparatus that provides an efficient circulation system, chemical management that provides reliable and uniform plating, and a configuration that provides short maintenance times and greater tool availability. Techniques include a processing tank containing an anolyte fluid, and one or more plating cells each having a catholyte fluid compartment with a circulation path that connects to a separate or remote catholyte reservoir. Thus, with such a configuration, a single pump can be used to flow catholyte (via manifolds) through one or more plating cells. Thus, with the catholyte reservoir maintained off board, instead of dumping catholyte over a weir into a reservoir, catholyte fluid—after flowing through a plating cell—is returned to the catholyte reservoir.
    Type: Application
    Filed: November 11, 2013
    Publication date: May 14, 2015
    Applicant: TEL NEXX, Inc.
    Inventors: Arthur Keigler, David Guarnaccia, Demetrius Papapanayiotou, Jonathan Hander
  • Patent number: 9017528
    Abstract: A process electrolyte replenishment module adapted to replenish ions in a process electrolyte in a substrate electrochemical deposition apparatus having a first anode and a first cathode, the replenishment module having a second anode. A process electrolyte recirculation compartment is disposed in the frame configured so that the process electrolyte is recirculating between the replenishment module and the deposition apparatus. An anode compartment is coupled to the process electrolyte recirculation compartment having the second anode, that is a soluble anode, for immersion in a secondary anolyte, and having a first ion exchange membrane being a cationic member separating the secondary anolyte from the process electrolyte.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: April 28, 2015
    Assignee: Tel Nexx, Inc.
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, David Guarnaccia, Jonathan Hander, Johannes Chiu
  • Publication number: 20150090599
    Abstract: This application relates to systems and methods for controlling current density in an electrochemical bath using an anode assembly that comprises a plurality of anodes arranged across a surface of the anode assembly. In one embodiment, each of the anodes may be coupled to a power supply through an intervening electrical switch. A switch controller enables the selection of which anodes should be turned on or off during processing. In this way, current density across the anode assembly can be controlled in a uniform manner by turning on and off select anodes. Turning off a portion of the anodes may lower current density in that region. Likewise, turning on the portion of anodes will increase the current density in that region.
    Type: Application
    Filed: October 2, 2013
    Publication date: April 2, 2015
    Applicant: TEL NEXX, Inc.
    Inventors: Jonathan Hander, Demetrius Papapanayiotou, Robert Moon, David Guarnaccia
  • Publication number: 20150008134
    Abstract: An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
    Type: Application
    Filed: July 1, 2014
    Publication date: January 8, 2015
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, Jonathan Hander, Johannes Chiu, David G. Guarnaccia, Daniel L. Goodman
  • Publication number: 20150008133
    Abstract: An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
    Type: Application
    Filed: July 1, 2014
    Publication date: January 8, 2015
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, Jonathan Hander, Johannes Chiu, David G. Guarnaccia, Daniel L. Goodman
  • Publication number: 20150008119
    Abstract: An electrochemical deposition system is described. The electrochemical deposition system includes one or more electrochemical deposition modules arranged on a common platform for depositing one or more metals on a substrate, and a chemical management system coupled to the one or more electrochemical deposition modules. The chemical management system is configured to supply at least one of the one or more electrochemical deposition modules with one or more metal constituents for depositing the one or more metals. The chemical management system can include at least one metal enrichment cell and at least one metal-concentrate generator cell.
    Type: Application
    Filed: July 1, 2014
    Publication date: January 8, 2015
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, Jonathan Hander, Johannes Chiu, David G. Guarnaccia, Daniel L. Goodman
  • Publication number: 20120298502
    Abstract: A process electrolyte replenishment module adapted to replenish ions in a process electrolyte in a substrate electrochemical deposition apparatus having a first anode and a first cathode, the replenishment module having a second anode. A process electrolyte recirculation compartment is disposed in the frame configured so that the process electrolyte is recirculating between the replenishment module and the deposition apparatus. An anode compartment is coupled to the process electrolyte recirculation compartment having the second anode, that is a soluble anode, for immersion in a secondary anolyte, and having a first ion exchange membrane being a cationic member separating the secondary anolyte from the process electrolyte.
    Type: Application
    Filed: April 12, 2012
    Publication date: November 29, 2012
    Inventors: Demetrius Papapanayiotou, Arthur Keigler, David Guarnaccia, Jonathan Hander, Johannes Chiu