Patents by Inventor Jonathan Kendall

Jonathan Kendall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR DETERMINING CELL CYCLE POSITION
    Publication number: 20070238123
    Abstract: The invention provides a novel, non-destructive and dynamic process for determining the cell cycle position of living cells. The invention also provides DNA constructs, and cell lines containing such constructs, that exhibit activation and deactivation of a detectable reporter molecule in a cell cycle specific manner. The invention thus allows greater precision in determining cell cycle phase status than existing techniques and further provides a method for continuous monitoring of cell cycle progression in individual cells.
    Type: Application
    Filed: June 12, 2007
    Publication date: October 11, 2007
    Applicants: GE HEALTHCARE UK LIMITED, CANCER RESEARCH TECHNOLOGY LIMITED
    Inventors: JONATHON PINES, NICHOLAS THOMAS, ANNE JONES, IAN GOODYER, MICHAEL FRANCIS, RAHMAN ISMAIL, JONATHAN KENDALL
  • CO2-processes photoresists, polymers, and photoactive compounds for microlithography
    Patent number: 6764809
    Abstract: A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; then subjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: July 20, 2004
    Assignees: North Carolina State University, University of North Carolina at Chapel Hill
    Inventors: Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall, Christopher L. McAdams
  • CO2-processes photoresists, polymers, and photoactive compounds for microlithography
    Publication number: 20020119398
    Abstract: A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; then subjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.
    Type: Application
    Filed: October 10, 2001
    Publication date: August 29, 2002
    Inventors: Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall, Christopher L. McAdams