Abstract: An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.

Abstract: An apparatus and method for dynamic and reversible patterning of mask layers and manipulation and redistribution of energy sources such as laser beams. An embodiment of the present invention provides an apparatus including a mirror-like thin film comprising a front surface and a back surface configured to reflect a laser beam; a layer of a mask material on top of the front surface of the mirror-like thin film, wherein the mask material is transparent to the laser beam and is dewetted by a heat source to create a height profile in the mask material.

Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.

Abstract: A method for lithographic patterning of thin films. A thin film is deposited on a substrate and the film is exposed to optical energy from a focused laser to induce a thermal gradient in the film by optical absorption. The film is softened through a melting or glass transition process and the thermal gradient induces a directional dewetting down the thermal gradient. The invention permits developer free positive tone lithography by thermal direct write and also metrology of the thin film by the morphology of the resultant features.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.

Abstract: Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.