Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit). The sample is placed on a motion system that moves the sample with respect to an electron beam generator that is used in imaging the sample. The motion system affords thirteen degrees-of-freedom for movement of the sample, by providing a rotation stage, a fine 6-axis piezoelectric-driven stage, and a coarse 6-axis hexapod stage. Various detectors gather information to image the sample. Interferometric and/or capacitive sensors are used to measure the position of the sample and motion system.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit). The sample is placed on a motion system that moves the sample with respect to an electron beam generator that is used in imaging the sample. The motion system affords thirteen degrees-of-freedom for movement of the sample, by providing a rotation stage, a fine 6-axis piezoelectric-driven stage, and a coarse 6-axis hexapod stage. Various detectors gather information to image the sample. Interferometric and/or capacitive sensors are used to measure the position of the sample and motion system.

Abstract: Disclosed is an example for determining miss distance and bullet speed of a burst of bullets. In one example, shock wave (SW) vectors emanating from bullets are estimated using a first sensor. Further, firing point (FP) vectors and closest-point-of-approach (CPA) vectors emanating from the bullets are estimated using a second sensor. The first sensor and the second sensor are disposed on a platform. The SW vectors, the FP vectors and the CPA vectors are determined as emanating from the burst of bullets. The miss distance and bullet speed of the burst of bullets are determined using the FP vectors, the SW vectors, and the CPA vectors that are emanating from the burst of bullets.

Abstract: Disclosed is an example for determining a projectile trajectory with at least two sensors. In one example, the projectile trajectory is estimated using a first sensor having a first angular range. Further, the projectile trajector is estimated using a second sensor having a second angular range. The first sensor and the second sensor are disposed on a platform at different spatial locations. Furthermore, a discrepancy in the projectile trajectory is determined when the projectile moves from the first angular range to the second angular range. The discrepancy is created due to the different spatial locations of the first sensor and the second sensor. An actual projectile trajectory is determined by compensating for the discrepancy in the projectile trajectory using the estimated discrepancy.

Abstract: Disclosed is an example for determining miss distance and bullet speed of a burst of bullets. In one example, shock wave (SW) vectors emanating from bullets are estimated using a first sensor. Further, firing point (FP) vectors and closest-point-of-approach (CPA) vectors emanating from the bullets are estimated using a second sensor. The first sensor and the second sensor are disposed on a platform. The SW vectors, the FP vectors and the CPA vectors are determined as emanating from the burst of bullets. The miss distance and bullet speed of the burst of bullets are determined using the FP vectors, the SW vectors, and the CPA vectors that are emanating from the burst of bullets.

Abstract: Disclosed is an example for determining a projectile trajectory with at least two sensors. In one example, the projectile trajectory is estimated using a first sensor having a first angular range. Further, the projectile trajector is estimated using a second sensor having a second angular range. The first sensor and the second sensor are disposed on a platform at different spatial locations. Furthermore, a discrepancy in the projectile trajectory is determined when the projectile moves from the first angular range to the second angular range. The discrepancy is created due to the different spatial locations of the first sensor and the second sensor. An actual projectile trajectory is determined by compensating for the discrepancy in the projectile trajectory using the estimated discrepancy.