Patents by Inventor Jonathan Sokolov

Jonathan Sokolov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130078386
    Abstract: In the present invention, an electric field is created in the DNA solution while DNA is deposited on a polymer surface. A method of electric field assisted deposition of DNA on polymer surface according to an exemplary embodiment of the present invention comprises: forming a polymethylmethacrylate (PMMA) film on a silicon wafer by spin casting; preparing a DNA solution including DNA to be deposited on the PMMA film; and depositing DNA on the PMMA film by creating an electric field in the DNA solution while the silicon wafer on which the PMMA film is formed is submerged in the DNA solution.
    Type: Application
    Filed: October 20, 2011
    Publication date: March 28, 2013
    Applicant: JunHwan RYU
    Inventors: JunHwan RYU, Jonathan Sokolov
  • Patent number: 7709569
    Abstract: A composition which includes polymethylmethacrylate and an organoclay functionalized with an intercalation agent, wherein said intercalation agent is a reaction product of a polyamine and an alkyl halide in a polar solvent, preferably a di-methyl, di-tallow ammonium functionalized montmorillonite clay.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: May 4, 2010
    Assignee: The Research Foundation of State University of New York
    Inventors: Miriam Rafailovich, Jonathan Sokolov, Benjamin Chu, Shaoming Zhu
  • Publication number: 20090227722
    Abstract: A composition which includes polymethylmethacrylate and an organoclay functionalized with an intercalation agent, wherein said intercalation agent is a reaction product of a polyamine and an alkyl halide in a polar solvent, preferably a di-methyl, di-tallow ammonium functionalized montmorillonite clay.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 10, 2009
    Inventors: Miriam Rafailovich, Jonathan Sokolov, Benjamin Chu, Shaoming Zhu
  • Patent number: 7521499
    Abstract: A composition which includes polymethylmethacrylate and an organoclay functionalized with intercalation agent, wherein said intercalation agent is a reaction product of a polyamine and an alkyl halide in a polar solvent, preferably a dimethyl, ditallow ammonium functionalized monmorillonite clay as shown in (FIG. 3).
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: April 21, 2009
    Assignee: Research Foundation of State University of New York
    Inventors: Miriam Rafailovich, Mayu Si, Michael Goldman, Jonathan Sokolov, Benjamin Chu, Shaoming Zhu
  • Patent number: 6339121
    Abstract: The present invention is polymer blend, which includes at least two immiscible polymers, and a compatibilizer used to produce a substantially homogeneous blend. The compatibilizer is a functionalized nanocomposite which prevents segregation of the polymer components in the polymer blend. The nanocomposites are formed by combining an organoclay and an intercalation agent. The intercalation agent is a reaction product of a polyamine functionalized with an alkyl halide in a polar solvent. The compatibilized blends are used in thin films, which are especially useful in microlithographic applications and as lubricants in low tolerance magnetic disks.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: January 15, 2002
    Assignee: The Research Foundation at State University of New York
    Inventors: Miriam Rafailovich, Jonathan Sokolov, Shaoming Zhu, Benjamin Chu