Patents by Inventor Jonathan Wolk

Jonathan Wolk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160143455
    Abstract: An adjustable display stand having an upwardly extending first extension arm attached to a base support. The first extension arm is formed to extend over at least a portion of the base support and is connected to a second extension arm. The second extension arm is formed to extend in a vertical direction above the base support and terminates in a support for an article to be displayed by the display stand.
    Type: Application
    Filed: November 22, 2015
    Publication date: May 26, 2016
    Inventor: Jonathan Wolk
  • Patent number: 7192886
    Abstract: A method for the caustic etching of silicon which is of importance for the semiconductor industry and silicon wafer manufacture in particular, that includes using one or more iodate or chlorite salts as additives in the etching process to achieve improved surface conditions, such as smaller facets and lower roughness, on the resulting silicon substrate.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: March 20, 2007
    Assignee: Intersurface Dynamics, Inc.
    Inventors: Wiltold Paw, Jonathan Wolk
  • Publication number: 20040089419
    Abstract: A method for the caustic etching of silicon which is of importance for the semiconductor industry and silicon wafer manufacture in particular, that includes using one or more iodate or chlorite salts as additives in the etching process to achieve improved surface conditions, such as smaller facets and lower roughness, on the resulting silicon substrate.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 13, 2004
    Inventors: Wiltold Paw, Jonathan Wolk