Abstract: The present invention is drawn to a ventilation system for a “climate object”, in particular all components with which the user of a vehicle may come in contact in a passenger compartment such as, for example, a steering mechanism for a vehicle, a dashboard, an armrest, a door paneling, a seat cover, a heating blanket, a padding, a cover or a seat, all which include at least one air flow device to guide air through the climate object.

Abstract: The present invention relates to an air conditioner with at least one air conduction device and a switching device. Provision is made that in a first operating state, the air conditioner has air passing at least partially through it in a first direction, that the air conditioner has air flowing through it at least partially in a second direction different from the first direction, and that the air conditioner has at least one switching device, to alter the flow direction of the air in the air conduction device.

Abstract: Systems and methods are disclosed for handling errors occurring when a first device requests information from a second device. Optionally the information and any corresponding error information are sent from the second device to a buffer. After the first device optionally receives the information and the error information from the buffer, the first device determines whether an error is associated with the information, and in response to determining that an error is associated with the information, the first device processes the error.

Abstract: The present invention discloses a station, e.g., for IC fabrication with a flexible configuration. It consists of an array of processing chambers, which are grouped into processing modules and arranged in a two-dimensional fashion, in vertical levels and horizontal rows, and is capable of operating independent of each other. Each processing chamber can perform electroless deposition and other related processing steps sequentially on a wafer with more than one processing fluid without having to remove it from the chamber. The system is served by a single common industrial robot, which may have a random to access to all the working chambers and cells of the storage unit for transporting wafers between the wafer cassettes and inlet/outlets ports of any of the chemical processing chambers. The station occupies a service-room floor space and a clean-room floor space.

Abstract: An optical access system includes a plurality of CWDM converters. A CWDM demux is coupled to at least a portion of the plurality of the CWDM converters. A CWDM mux is coupled to at least a portion of the plurality of the CWDM converters. An optical circulator, or a wideband splitter, is coupled to the demux and the mux by a single fiber. A first CWDM add/drop device is coupled to the optical circulator, or the wideband splitter, and to a first coupler. A first CWDM converter is coupled to the first coupler. A wireless access point is coupled to the CWDM converter.

Abstract: A method for transmitting wireless signals from a plurality of wireless access points (AP) to a train is disclosed in this invention. The method includes a step of connecting a high speed wide-area local area network (WLAN) switch between a network and a multiplexed Ethernet fiber system for receiving and transmitting a plurality of Internet signals to the plurality of wireless access points (AP). The method further includes a step of implementing a wireless signal receiving and distribution system on the train for processing a roaming and handover from receiving the plurality of signals from one of the wireless access point to a next wireless access point. The method further includes a step of distributing the plurality of signals to a plurality of passenger-users traveling on the train.

Abstract: An apparatus of the invention has a closable chamber that can be sealed and is capable of withstanding an increased pressure and high temperature. The chamber contains a substrate holder that can be rotated around a vertical axis, and an edge-grip mechanism inside the substrate holder. The deposition chamber has several inlet ports for the supply of various process liquids, such as deposition solutions, DI water for rinsing, etc., and a port for the supply of a gas under pressure. The apparatus is also provided with reservoirs and tanks for processing liquids and gases, as well as with a solution heater and a control system for controlling temperature and pressure in the chamber. The heater can be located outside the working chamber or built into the substrate holder, or both heaters can be used simultaneously. Uniform deposition is achieved by carrying out the deposition process under pressure and under temperature slightly below the boiling point of the solution.

Abstract: A universal substrate holder of the invention for treating wafer substrates in liquids is provided with a shaft and a rod slidingly inserted into the central opening of the shaft. The end of the shaft that protrudes into the bowl supports a base platform for the substrate, while the end of the rod that protrudes into the bowl has radial arms that rigidly support an annular plate with pins that can pass through the opening of the base platform so that they can support the substrate above the surface of the platform. The annular plate supports clamping jaws made in the form of two-arm levers with shorter arms and longer arms. The longer arms are heavier and therefore in the stationary state of the holder keep the jaws turned into an open position. When the shaft begins to rotate, the jaws are turned under the effect of centrifugal forces into positions of clamping the substrate with the shorter arms.