Patents by Inventor Jonathon M. Lobbins

Jonathon M. Lobbins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composite laminated catheter with flexible segment and method of making same
    Patent number: 8303569
    Abstract: A medical catheter including a composite laminated shaft having a longitudinal segment that is mechanically deformed to have reduced and varying stiffness. A method of making the catheter is also disclosed.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: November 6, 2012
    Assignee: Medtronic Vascular, Inc.
    Inventors: Jonathon M. Lobbins, Kenneth D. Warnock, Jr., Michelle Provost, Lee Core, Michael Papa, Michael Riopel
  • Method for forming dielectric stack including second dielectric layer with lower undoped portion and upper doped portion
    Patent number: 6506690
    Abstract: An intermediary dielectric layer is disposed between two dielectric layers thereby eliminating a flow stabilization step that may produce unwanted deposition that leads to peeling. A wafer is provided having an HDP layer. An undoped silicon glass layer is deposited on top of the HDP layer to improve adherence of a subsequently deposited PSG layer.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: January 14, 2003
    Assignee: Agere Systems Inc.
    Inventor: Jonathon M. Lobbins
  • Method for enhanced dielectric film uniformity
    Patent number: 6156675
    Abstract: The present invention relates to an apparatus and method for depositing a film on a wafer. A reactor for depositing a film on a surface of a wafer comprises a processing chamber having an electrode, a ceramic wafer support supporting the wafer and separated from the electrode by a distance of between 230 and 240 millimeters, a gas inlet supplying gas reactants, and a radio frequency inlet supplying radio frequency energy. The reactor further comprises a heating chamber having at least one heat source which heats the wafer. A method for depositing a film on a surface of a semiconductor wafer comprises providing a processing chamber having a ceramic wafer support supporting the wafer and an electrode, separating the electrode from the ceramic wafer support by a distance of between 230 and 240 millimeters, supplying radio frequency energy into the processing chamber, supplying gas reactants into the processing chamber, and heating the wafer.
    Type: Grant
    Filed: September 28, 1999
    Date of Patent: December 5, 2000
    Assignee: Lucent Technologies, Inc.
    Inventors: Jonathon M. Lobbins, Leonard J. Olmer