Abstract: In one embodiment, a fastener includes a flexible head and a shank coupled to the flexible head. The flexible head includes a center head portion and a plurality of wing portions coupled to the center head portion. Each of the plurality of wing portions includes a contact area configured to contact a first surface of a part to be fastened. The shank includes a clip groove configured to hold a retainer clip against a second surface of the part to be fastened. The second first surface of the part to be fastened is opposite the first surface of the part to be fastened.

Abstract: A plasma confinement system includes an enclosure, one or more internal magnetic coils suspended within the enclosure in a plasma region, and one or more supports configured to support the one or more internal magnetic coils suspended within the enclosure. Each support of the one or more supports includes a first end and a second end opposite the first end. The first end is coupled to an interior portion of the enclosure and the second end is coupled to a component disposed within the plasma region. Each support further includes electrical conducting material disposed between the first end and the second end. The electrical conducting material is configured to, when supplied with one or more electrical currents, generate a magnetic field having a magnetic field gradient that varies along the support from the first end to the second end.

Abstract: In one embodiment, a fastener includes a flexible head and a shank coupled to the flexible head. The flexible head includes a center head portion and a plurality of wing portions coupled to the center head portion. Each of the plurality of wing portions includes a contact area configured to contact a first surface of a part to be fastened. The shank includes a clip groove configured to hold a retainer clip against a second surface of the part to be fastened. The second first surface of the part to be fastened is opposite the first surface of the part to be fastened.

Abstract: A monolithic heating element is provided. In one embodiment, the heating element includes a monolithic structure that is not a filament and a plurality of electrodes attached to the monolithic structure. Application of an electric current between the plurality of electrodes generates heat in the monolithic structure which can be tailored to any desired heating profile and is robust to single point failures due to thermal runaway.

Abstract: In one embodiment, a system includes a cathode and a thermionic emitter installed at least partially within the cathode tube of the cathode. The thermionic emitter is in a shape of a hollow cylinder. The hollow cylinder includes an outer surface and an unsmooth inner surface. The outer surface is configured to contact an inner surface of the cathode tube. The unsmooth inner surface includes a plurality of structures that provide an increase in surface area over a smooth surface.

Abstract: In one embodiment, a system includes a cathode and a thermionic emitter installed at least partially within the cathode tube of the cathode. The thermionic emitter is in a shape of a hollow cylinder. The hollow cylinder includes an outer surface and an unsmooth inner surface. The outer surface is configured to contact an inner surface of the cathode tube. The unsmooth inner surface includes a plurality of structures that provide an increase in surface area over a smooth surface.

Abstract: A plasma confinement system includes an enclosure, one or more internal magnetic coils suspended within the enclosure in a plasma region, and one or more supports configured to support the one or more internal magnetic coils suspended within the enclosure. Each support of the one or more supports includes a first end and a second end opposite the first end. The first end is coupled to an interior portion of the enclosure and the second end is coupled to a component disposed within the plasma region. Each support further includes electrical conducting material disposed between the first end and the second end. The electrical conducting material is configured to, when supplied with one or more electrical currents, generate a magnetic field having a magnetic field gradient that varies along the support from the first end to the second end.