Abstract: The present disclosure relates to a display device, more particularly, to a display device in which the number of contact holes may be reduced to improve space utilization of pixels, and the method for fabricating the same. According to an embodiment of the disclosure, the display device includes a first active layer, a first transistor connected to the first active layer, a pixel electrode connected to the first transistor, a second active layer including a material different from a material of the first active layer, and a second transistor connected to the second active layer. At least a portion of the second active layer is directly connected to at least a portion of the first active layer.

Abstract: Provided is a semiconductor device. The semiconductor device includes a second semiconductor pattern disposed on the substrate and configured to provide a channel region, and a first semiconductor pattern disposed between the substrate and the second semiconductor pattern, wherein the first semiconductor pattern includes a channel region that is a portion in contact with the second semiconductor pattern and source/drain regions that are portions exposed by the second semiconductor pattern.