Abstract: A mounting structure of a steering column for a vehicle is provided with a column mounting bracket coupling the steering column to a cowl cross-member. A pedal bracket is coupled to a dash panel of the vehicle and a contact prevention part is provided at the column mounting bracket so that contact between an inner end of the pedal bracket and the column mounting bracket is minimized. Therefore, injuries to a driver and noise from vibration are minimized along with an increase in workability in manufacturing and assembly of the pedal structure.

Abstract: This invention relates to a copolymer for the manufacture of chemical amplified photoresist and a chemical amplified positive photoresist composition comprising a copolymer for the manufacture of chemical amplified photoresist as a base resin, as represented by the following formula 1, an acid generator and additive, Wherein, R1, R2, R3 and R4 are independently a hydrogen atom or a lower alkyl group; R5, R6, R7 and R8 are a hydrogen atom, an alkyl group of C1-8, an alkoxy group, an alkoxycarbonyl group or a halogen atom; h and i are independently an integer of 0-8; k, l, m and n represent an integer of element units provided that 0.3<k/(k+l+m+n)<0.9, 0≦l/(k+l+m+n)<0.6, 0≦m/(k+l+m+n)<0.6, and 0.01<n/(k+l+m+n)<0.