Patents by Inventor Jong Chen Yang

Jong Chen Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance
    Patent number: 7067409
    Abstract: A method of manufacturing a semiconductor device contact including forming an insulating layer over a substrate and forming an agglutinating layer over the insulating layer. The agglutinating layer is then exposed to a plasma treatment. A barrier layer is formed over the plasma-treated agglutinating layer, and a conductive layer is formed over the barrier layer.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: June 27, 2006
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jian Shin Tsai, Yu Hua Chou, Tzo Hung Luo, Chi Chan Tseng, Wei Zhang, Jong Chen Yang