Patents by Inventor Jong-Chul Shin

Jong-Chul Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240088751
    Abstract: A motor includes a rotor and a stator, in which the rotor includes: a rotor core including a plurality of core portions disposed on a rotation shaft along an axial direction of the rotor, wherein the rotor core includes a core flow path through which a cooling fluid passes through each core portion; and a cooling plate which is inserted between the two divided core portions so that both surfaces are joined to the two neighboring core portions, and a distribution flow path that distributes the cooling fluid supplied from a cooling flow path of the rotation shaft into the core flow path of the two neighboring core portions is provided between at least one of the two neighboring core portions and the cooling plate.
    Type: Application
    Filed: February 1, 2023
    Publication date: March 14, 2024
    Applicants: Hyundai Motor Company, Kia Corporation
    Inventors: Jung Woo LEE, Young Jin SHIN, Ju Ho LEE, Young Chul KIM, Jong Hoon LEE
  • Publication number: 20240074065
    Abstract: A reprint apparatus may include: a defect checking unit configured to check a defective portion in a solder resist layer of a circuit board; a material filling unit positioned above the circuit board to fill the defective portion with a filling material; and a curing unit configured to cure the material filled in the defective portion. The defect checking unit may be configured to calculate a volume of the defective portion, and the material filling unit may be configured to calculate a discharge amount of the filling material based on the calculated volume of the defective portion, and then discharge the filling material by the discharge amount.
    Type: Application
    Filed: February 17, 2023
    Publication date: February 29, 2024
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Do Jae YOO, Yong Gil NAMGUNG, Jong Hoon SHIN, Sang Soon CHOI, Young Chul AN
  • Publication number: 20240072140
    Abstract: A semiconductor device includes, first and second source/drain patterns on an active pattern and spaced apart from each other, a first source/drain contact on the first source/drain pattern and including a first source/drain barrier film and a first source/drain filling film on the first source/drain barrier film, a second source/drain contact on the second source/drain pattern, and a gate structure on the active pattern between the first and second source/drain contacts and including a gate electrode, wherein a top surface of the first source/drain contact is lower than a top surface of the gate structure, and a height from a top surface of the active pattern to a top surface of the first source/drain barrier film is less than a height from the top surface of the active pattern to a top surface of the first source/drain filling film.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Inventors: Won Hyuk Lee, Jong Chul Park, Sang Duk Park, Hong Sik Shin, Do Haing Lee
  • Patent number: 11001732
    Abstract: Disclosed is a chemical-mechanical polishing slurry composition having a small change in pH over time under an acidic condition and thus being easy to store for a long time. The chemical-mechanical polishing slurry composition includes an abrasive; an amount of about 0.000006 to 0.01 weight % of an aluminum component based on the total weight of the polishing slurry composition; and water. The number of silanol groups on a surface of the abrasive and a content of the aluminum component satisfy the requirements of following Equation 1: 0.0005?(S*C)*100?4.5,??[Equation 1] wherein, S is the number of the silanol groups present on 1 nm2 of the abrasive surface (unit: number/nm2), and C is the content of the aluminum component (weight %) in the slurry composition.
    Type: Grant
    Filed: November 13, 2018
    Date of Patent: May 11, 2021
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Hye Jung Park, Jae Hyun Kim, Jong Dai Park, Min Gun Lee, Jong Chul Shin, Sung Hoon Jin
  • Publication number: 20190077994
    Abstract: Disclosed is a chemical-mechanical polishing slurry composition having a small change in pH over time under an acidic condition and thus being easy to store for a long time. The chemical-mechanical polishing slurry composition includes an abrasive; an amount of about 0.000006 to 0.01 weight % of an aluminum component based on the total weight of the polishing slurry composition; and water. The number of silanol groups on a surface of the abrasive and a content of the aluminum component satisfy the requirements of following Equation 1: 0.0005?(S*C)*100?4.5,??[Equation 1] wherein, S is the number of the silanol groups present on 1 nm2 of the abrasive surface (unit: number/nm2), and C is the content of the aluminum component (weight %) in the slurry composition.
    Type: Application
    Filed: November 13, 2018
    Publication date: March 14, 2019
    Inventors: Hye Jung Park, Jae Hyun Kim, Jong Dai Park, Min Gun Lee, Jong Chul Shin, Sung Hoon Jin
  • Publication number: 20190077993
    Abstract: Disclosed is a chemical-mechanical polishing slurry composition having a small change in pH over time under an acidic condition and thus being easy to store for a long time. The chemical-mechanical polishing slurry composition includes an abrasive; an amount of about 0.000006 to 0.01 weight % of an aluminum component based on the total weight of the polishing slurry composition; and water. The number of silanol groups on a surface of the abrasive and a content of the aluminum component satisfy the requirements of following Equation 1: 0.0005?(S*C)*100?4.5,??[Equation 1] wherein, S is the number of the silanol groups present on 1 nm2 of the abrasive surface (unit: number/nm2), and C is the content of the aluminum component (weight %) in the slurry composition.
    Type: Application
    Filed: November 13, 2018
    Publication date: March 14, 2019
    Inventors: Hye Jung Park, Jae Hyun Kim, Jong Dai Park, Min Gun Lee, Jong Chul Shin, Sung Hoon Jin
  • Patent number: 10043678
    Abstract: The present invention relates to a slurry composition for reducing scratches generated when polishing the metal film in a manufacturing process of a semiconductor integrated circuit, by lowering frictional force so that a temperature of the composition which may rise during the polishing is lowered, the thermal stability of the slurry is improved and the size increase of particles in the slurry is suppressed, and a method for reducing scratches using the same. The method comprises the steps of applying a slurry composition for polishing a metal film to a substrate on which the metal film is formed, the slurry composition containing an organic solvent including a nitrogen atom and a glycol-based organic solvent; and making a polishing pad to be contacted to the substrate and moving the polishing pad with respect to the substrate, thereby removing at least part of the metal film from the substrate.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: August 7, 2018
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Chang Yong Park, Jong Dai Park, Jong Chul Shin, Jae Hyun Kim, Goo Hwa Lee, Min Sung Park
  • Publication number: 20160247693
    Abstract: The present invention relates to a slurry composition for reducing scratches generated when polishing the metal film in a manufacturing process of a semiconductor integrated circuit, by lowering frictional force so that a temperature of the composition which may rise during the polishing is lowered, the thermal stability of the slurry is improved and the size increase of particles in the slurry is suppressed, and a method for reducing scratches using the same. The method comprises the steps of applying a slurry composition for polishing a metal film to a substrate on which the metal film is formed, the slurry composition containing an organic solvent including a nitrogen atom and a glycol-based organic solvent; and making a polishing pad to be contacted to the substrate and moving the polishing pad with respect to the substrate, thereby removing at least part of the metal film from the substrate.
    Type: Application
    Filed: October 21, 2014
    Publication date: August 25, 2016
    Inventors: Chang Yong PARK, Jong Dai PARK, Jong Chul SHIN, Jae Hyun KIM, Goo Hwa LEE, Min Sung PARK
  • Patent number: 9367153
    Abstract: A display apparatus and a method thereof. The display apparatus includes a display with variable transparency, a sensor which senses a location of at least one of a person and an object, and a controller which determines proximity of the at least one of the person and the object to the display based on a result of the sensing by the sensor, and adjusts the transparency of the display differently according to a result of the determining. Accordingly, a user can easily recognize contents displayed on the display screen having high transparency in the display apparatus.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: June 14, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-chul Shin, Na-young Kwon, Sang-bong Lee
  • Patent number: 8890881
    Abstract: Provided are a mapping method and a video system for mapping pixel data included in the same pixel group to the same bank of a memory, A method for mapping the position of pixel data of a picture to an address of a memory comprises a pixel group dividing operation and an address mapping operation. The pixel group dividing operation divides the pixels of the picture into at least one pixel group. The address mapping operation maps pixel data of pixels included in the same pixel group to the same bank of the memory.
    Type: Grant
    Filed: August 22, 2007
    Date of Patent: November 18, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-chul Shin, Kee-won Joe, Sang-jun Yang
  • Publication number: 20140035850
    Abstract: A display apparatus and a method thereof. The display apparatus includes a display with variable transparency, a sensor which senses a location of at least one of a person and an object, and a controller which determines proximity of the at least one of the person and the object to the display based on a result of the sensing by the sensor, and adjusts the transparency of the display differently according to a result of the determining. Accordingly, a user can easily recognize contents displayed on the display screen having high transparency in the display apparatus.
    Type: Application
    Filed: July 30, 2013
    Publication date: February 6, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jong-chul SHIN, Na-young KWON, Sang-bong LEE
  • Patent number: 8305127
    Abstract: A data delay control circuit and method that can adaptively reflect changes in an operating environment, such as an operating temperature, an operating voltage and a manufacturing process of a semiconductor chip. The data delay control circuit is designed to be able to adaptibly delay data when an expected delay of a predetermined period should be required when the semiconductor chip is designed. The data delay circuit includes a clock oscillation unit that can reflect changes in a delay period of a delay cell and automatically adjust the delay period of the delay cell. Since the data delay circuit includes a monitoring circuit and a plurality of delay paths, the data delay circuit can provide a delay path having a desired delay value. Therefore, even when the operating environment of a semiconductor device changes, the data delay circuit can control the delay period of a data signal.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: November 6, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jong-Chul Shin
  • Patent number: 8227715
    Abstract: A keypad assembly mounted in a portable terminal is disclosed. The keypad assembly has a window keypad including a display window disposed on a front face of the portable terminal. A keypad top is integrally molded with the display window and simultaneously assembled on the front face of the portable terminal, thereby providing an easier assembly than known heretofore, as two parts can be assembled at the same time and additionally provide an elegant exterior front face.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: July 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Won Park, Jong-Chul Shin, Jong-Kyun Shin, Young-Bae Ji
  • Patent number: 7996601
    Abstract: Provided are an apparatus and method for partially accessing a DRAM. The apparatus for partially accessing a DRAM includes a memory controller. The memory controller includes a first sub-controller which controls a first DRAM and a second sub-controller which controls a second DRAM. Accordingly, a garbage cycle, i.e., an operation which wastes data transfer bandwidth, that may generate when a related art DRAM accessing apparatus is used, is removed.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: August 9, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Yang, Jong-chul Shin
  • Publication number: 20100200386
    Abstract: A keypad assembly mounted in a portable terminal is disclosed. The keypad assembly has a window keypad including a display window disposed on a front face of the portable terminal. A keypad top is integrally molded with the display window and simultaneously assembled on the front face of the portable terminal, thereby providing an easier assembly than known heretofore, as two parts can be assembled at the same time and additionally provide an elegant exterior front face.
    Type: Application
    Filed: January 29, 2010
    Publication date: August 12, 2010
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jung-Won PARK, Jong-Chul SHIN, Jong-Kyun SHIN, Young-Bae JI
  • Publication number: 20100182064
    Abstract: A data delay control circuit and method that can adaptively reflect changes in an operating environment, such as an operating temperature, an operating voltage and a manufacturing process of a semiconductor chip. The data delay control circuit is designed to be able to adaptibly delay data when an expected delay of a predetermined period should be required when the semiconductor chip is designed. The data delay circuit includes a clock oscillation unit that can reflect changes in a delay period of a delay cell and automatically adjust the delay period of the delay cell. Since the data delay circuit includes a monitoring circuit and a plurality of delay paths, the data delay circuit can provide a delay path having a desired delay value. Therefore, even when the operating environment of a semiconductor device changes, the data delay circuit can control the delay period of a data signal.
    Type: Application
    Filed: March 18, 2010
    Publication date: July 22, 2010
    Inventor: Jong-Chul Shin
  • Patent number: 7761763
    Abstract: A system-on-chip (SOC) having built-in-self-test (BIST) circuits and a self-test method of the SOC are provided. The SOC having the BIST circuits includes intellectual property (IP) blocks having BIST logic circuits and a BIST control unit. The BIST logic circuit operates in a normal or a test mode in response to control data received through a system bus, and outputs test result data in the test mode. The BIST control unit tests the IP blocks by transferring the control data, a command signal, test pattern data, and test address signals to the BIST logic circuit through the system bus, and compresses and stores the test result data received through the system bus in the test mode.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: July 20, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-Chul Shin, Jong-Ho Kim, Hae-Young Rha, Kee-Won Joe
  • Patent number: 7696802
    Abstract: A data delay control circuit and method that can adaptively reflect changes in an operating environment, such as an operating temperature, an operating voltage and a manufacturing process of a semiconductor chip. The data delay control circuit is designed to be able to adaptibly delay data when an expected delay of a predetermined period should be required when the semiconductor chip is designed. The data delay circuit includes a clock oscillation unit that can reflect changes in a delay period of a delay cell and automatically adjust the delay period of the delay cell. Since the data delay circuit includes a monitoring circuit and a plurality of delay paths, the data delay circuit can provide a delay path having a desired delay value. Therefore, even when the operating environment of a semiconductor device changes, the data delay circuit can control the delay period of a data signal.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: April 13, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jong-Chul Shin
  • Patent number: 7622152
    Abstract: A MoSi2—Si3N4 composite coating which is coated on a surface of base materials. The MoSi2—Si3N4 composite coating on the surface of the base material can be formed by forming a Mo2N diffusion layer by vapor-depositing of nitrogen on the surface of the base material and forming a MoSi2—Si3N4 composite coating by vapor-depositing of silicon on the surface of the Mo2N diffusion layer, or the MoSi2—Si3N4 composite coating on the surface of the base material can be formed by forming a MoSi2 diffusion layer by vapor-depositing of silicon on a surface of a base material by the CVD method, transforming the MoSi2 diffusion layer into a Mo5Si3 diffusion layer by heating under a high-purity hydrogen or argon atmosphere, forming a MoSi2—Si3N4 composite diffusion layer by vapor-depositing of nitrogen on the surface of the MosSi3 diffusion layer by the CVD method and forming a MoSi2—Si3N4 composite coating by vapor-depositing of silicon on the surface of the MoSi2—Si3N4 composite diffusion layer.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: November 24, 2009
    Assignee: Korea Institute of Science and Technology
    Inventors: Jae Soo Kim, Kyeung Ho Kim, Ji Young Byun, Jin-Kook Yoon, Doo Yong Kim, Jong Kown Lee, Jong Chul Shin, Dae Ho Rho
  • Publication number: 20080313515
    Abstract: A system-on-chip (SOC) having built-in-self-test (BIST) circuits and a self-test method of the SOC are provided. The SOC having the BIST circuits includes intellectual property (IP) blocks having BIST logic circuits and a BIST control unit. The BIST logic circuit operates in a normal or a test mode in response to control data received through a system bus, and outputs test result data in the test mode. The BIST control unit tests the IP blocks by transferring the control data, a command signal, test pattern data, and test address signals to the BIST logic circuit through the system bus, and compresses and stores the test result data received through the system bus in the test mode.
    Type: Application
    Filed: July 30, 2008
    Publication date: December 18, 2008
    Inventors: Jong-Chul Shin, Jong-Ho Kim, Hae-Young Rha, Kee-Won Joe