Abstract: The present invention relates to a sealing method for a display element, and more particularly, to a sealing method for a display element which fundamentally prevents an error due to contact between light emitting bodies of upper and lower sealing members by protecting a surface of a light emitting layer and an electrode with a curing body of a photocurable transparent composition, enhances workability of a display element sealing, provides good moisture resistance and adhesiveness and improves an aperture ratio of a display element by making a top emission available to thereby make a thinner, larger display element.

Abstract: A method for preparing a chemical mechanical polishing slurry composition comprises the steps of preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; preparing an oxide containing silicon and iron as an additive by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution to form an additive solution; and mixing the additive solution with at least one abrasive, at least one oxidizing agent and optionally at least one additional component to form the chemical mechanical polishing slurry composition.

Abstract: A method for preparing a chemical mechanical polishing slurry composition comprises the steps of preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; preparing an oxide containing silicon and iron as an additive by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution to form an additive solution; and mixing the additive solution with at least one abrasive, at least one oxidizing agent and optionally at least one additional component to form the chemical mechanical polishing slurry composition.

Abstract: The present invention relates to a getter paste composition, and more particularly, to a getter paste composition which is quickly densified at low densification temperatures to be applied to a device that is weak to heat, provides good adhesiveness, controls moisture and gas effectively and is screen-printable to thereby improve productivity.

Abstract: The present invention relates to a glass frit and a sealing method for an electric element using the same, and more particularly, to a glass frit which provides a good sealing effect to moisture and gas and is processable at low temperatures, and a sealing method for an electric element using the same.

Abstract: Disclosed is a method for preparing an additive solution which can be contained in a chemical mechanical polishing slurry composition used for a semiconductor manufacturing process. The method for preparing an additive solution for a chemical mechanical polishing slurry composition comprises the steps of: preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; and preparing an oxide containing silicon and iron by admixing and stirring a silicon salt and the aqueous iron salt solution for carrying out a reaction of the silicon salt and the aqueous iron salt solution.

Abstract: The present invention relates to a glass frit and a sealing method for an electric element using the same, and more particularly, to a glass frit which provides a good sealing effect to moisture and gas and is processable at low temperatures, and a sealing method for an electric element using the same.

Abstract: The present invention relates to a getter paste composition, and more particularly, to a getter paste composition which is quickly densified at low densification temperatures to be applied to a device that is weak to heat, provides good adhesiveness, controls moisture and gas effectively and is screen-printable to thereby improve productivity.

Abstract: The present invention relates to a sealing method for a display element, and more particularly, to a sealing method for a display element which fundamentally prevents an error due to contact between light emitting bodies of upper and lower sealing members by protecting a surface of a light emitting layer and an electrode with a curing body of a photocurable transparent composition, enhances workability of a display element sealing, provides good moisture resistance and adhesiveness and improves an aperture ratio of a display element by making a top emission available to thereby make a thinner, larger display element.

Abstract: A conductive coating composition and a method for producing coating layer using the same are disclosed. The conductive coating composition is capable of forming an antistatic coating layer on the protective film surface of display device. The conductive coating composition includes: 1 to 30 wt % of polyethylene dioxythiophene aqueous-dispersed solution; 5 to 15 wt % of water-soluble binder resin; 0.2 to 10 wt % of melamine resin; 6 to 40 wt % of alcohol solvent; 5 to 30 wt % of organic solvent selected from the group consisting of dimethyl sulfoxide, propyleneglycol methylether, N-methylpyrrolidone, ethyl-3-ethoxypropionate, propyleneglycol monomethyletheracetate, butylcarbitol and the mixtures thereof; and 10 to 50 wt % of water. The method for producing the conductive coating layer includes the steps of coating the conductive coating composition on a substrate; and drying the coating composition.

Abstract: A conductive coating composition and a method for producing coating layer using the same are disclosed. The conductive coating composition is capable of forming an antistatic coating layer on the protective film surface of display device. The conductive coating composition includes: 1 to 30 wt % of polyethylene dioxythiophene aqueous-dispersed solution; 5 to 15 wt % of water-soluble binder resin; 0.2 to 10 wt % of melamine resin; 6 to 40 wt % of alcohol solvent; 5 to 30 wt % of organic solvent selected from the group consisting of dimethyl sulfoxide, propyleneglycol methylether, N-methylpyrrolidone, ethyl-3-ethoxypropionate, propyleneglycol monomethyletheracetate, butylcarbitol and the mixtures thereof; and 10 to 50 wt % of water. The method for producing the conductive coating layer includes the steps of coating the conductive coating composition on a substrate; and drying the coating composition.

Abstract: Disclosed are an oxidizing agent useful for preparing a chemical mechanical polishing (CMP) slurry composition and a method for producing the same. The method for preparing an oxidizing agent for a CMP slurry composition comprises the steps of: preparing an aqueous iron salt solution by admixing an iron salt and cooled water of 5° C. or less; and preparing a nano synthesis particle by admixing and stirring a silica salt and the aqueous iron salt solution for carrying out a reaction of the silica salt, wherein the nano synthesis particle is a colloidal silica containing iron.

Abstract: Disclosed is a chemical mechanical polishing (CMP) slurry having a superior polishing efficiency as well as being capable of effectively converting a metal layer to be polished into a metal oxide layer. The CMP slurry composition includes an abrasive, an oxidizing agent, an iron-doped colloidal silica, and water. Preferably, the amount of the iron-doped colloidal silica is 0.0001 to 0.5 weight % with respect to the total CMP slurry composition, and the iron-doped colloidal silica is produced by reacting a silica salt with an iron salt in an aqueous solution state. The preferable amount of Si contained in the silica salt is 2 to 10 times of the amount of Fe contained in the iron salt by mole ratio.