Abstract: Provided is a nanoplasmonic sensor and a kit for biomolecule analysis, and a method of analyzing a biomolecule using the same. The method includes: providing the nanoplasmonic sensor including a dielectric grating extending in one direction, and a metal structure disposed to cover an upper surface and a side surface of the dielectric grating and have at least one bent portion; immobilizing a first probe molecule on a surface of the metal structure; hybridizing an analyte with the first probe molecule by introducing the analyte having a base sequence complementary to the first probe molecule; binding a second probe molecule that is hybridized with the first probe molecule to the analyte; binding an enzyme to the second probe molecule; introducing a substrate that reacts with the enzyme to produce a precipitate by an enzymatic reaction; and measuring localized surface plasmon resonance in the metal structure.

Abstract: Methods of forming two-dimensional nanopatterns are provided. The method may comprise periodically contacting a vibrating tool comprising a patterned grating edge with a substrate along a first direction in a grating-vibrational indentation patterning process. The patterned grating edge defines a plurality of rows and a plurality of interspersed troughs. The periodic contacting creates a two dimensional array of discontinuous voids in a single-stroke across the surface of the substrate. In other aspects, a microfluidic device for selective arrangement of a microspecies or nanospecies is provided, that includes a substrate comprising a surface defining a two-dimensional pattern of microvoids or nanovoids. In yet other aspects, the present disclosure provides a method for selective arrangement of a microspecies or nanospecies on a substrate.

Abstract: Provided is a nanoplasmonic sensor and a kit for biomolecule analysis, and a method of analyzing a biomolecule using the same. The method includes: providing the nanoplasmonic sensor including a dielectric grating extending in one direction, and a metal structure disposed to cover an upper surface and a side surface of the dielectric grating and have at least one bent portion; immobilizing a first probe molecule on a surface of the metal structure; hybridizing an analyte with the first probe molecule by introducing the analyte having a base sequence complementary to the first probe molecule; binding a second probe molecule that is hybridized with the first probe molecule to the analyte; binding an enzyme to the second probe molecule; introducing a substrate that reacts with the enzyme to produce a precipitate by an enzymatic reaction; and measuring localized surface plasmon resonance in the metal structure.

Abstract: A method of transferring a reverse pattern using an imprint process includes: preparing a master mold, where a first pattern is defined on a surface of the master mold; coating an imprint resin on the master mold to cover the first pattern; pressing the imprint resin toward the master mold using a stamp member; curing the imprint resin to form a second pattern between the master mold and the stamp member, where the second pattern has a reverse shape to a shape of the first pattern; detaching the stamp member from the master mold to separate the second pattern from the master mold; and transferring the second pattern onto a transfer substrate.

Abstract: A master wafer includes: a plurality of unit wafers each including a pattern disposed thereon; a coupling surface defined on each of the unit wafers; and a coupling part which couples adjacent unit wafers among the plurality of unit wafers on which the coupling surface is defined, to each other.

Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.

Abstract: A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.

Abstract: A pattern structure includes a plurality of pattern structure units arranged on a same plane, where each of the plurality of pattern structure units includes a plurality of microstructures defined on a surface thereof and having a width of less than about 1 micrometer (?m); and a connection layer disposed between the plurality of pattern structure units and having a width of less than about 10 ?m, where the connection layer connects the plurality of pattern structure units to each other.

Abstract: Methods of forming two-dimensional nanopatterns are provided. The method may comprise periodically contacting a vibrating tool comprising a patterned grating edge with a substrate along a first direction in a grating-vibrational indentation patterning process. The patterned grating edge defines a plurality of rows and a plurality of interspersed troughs. The periodic contacting creates a two dimensional array of discontinuous voids in a single-stroke across the surface of the substrate. In other aspects, a microfluidic device for selective arrangement of a microspecies or nanospecies is provided, that includes a substrate comprising a surface defining a two-dimensional pattern of microvoids or nanovoids. In yet other aspects, the present disclosure provides a method for selective arrangement of a microspecies or nanospecies on a substrate.

Abstract: A master wafer includes: a plurality of unit wafers each including a pattern disposed thereon; a coupling surface defined on each of the unit wafers; and a coupling part which couples adjacent unit wafers among the plurality of unit wafers on which the coupling surface is defined, to each other.

Abstract: A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.

Abstract: A pattern structure includes a plurality of pattern structure units arranged on a same plane, where each of the plurality of pattern structure units includes a plurality of microstructures defined on a surface thereof and having a width of less than about 1 micrometer (?m); and a connection layer disposed between the plurality of pattern structure units and having a width of less than about 10 ?m, where the connection layer connects the plurality of pattern structure units to each other.

Abstract: A method of transferring a reverse pattern using an imprint process includes: preparing a master mold, where a first pattern is defined on a surface of the master mold; coating an imprint resin on the master mold to cover the first pattern; pressing the imprint resin toward the master mold using a stamp member; curing the imprint resin to form a second pattern between the master mold and the stamp member, where the second pattern has a reverse shape to a shape of the first pattern; detaching the stamp member from the master mold to separate the second pattern from the master mold; and transferring the second pattern onto a transfer substrate.

Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.