Patents by Inventor Jong Gab Na

Jong Gab Na has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering target for forming magnetic thin film and fabrication method thereof
    Patent number: 5955685
    Abstract: A sputtering target for forming a magnetic thin film includes iron powder and at least one first oxide powder selected from the oxides of barium, strontium and lead. The fabrication method of a sputtering target for forming a magnetic thin film comprises the steps of molding a mixture comprising an iron-first oxide powder, or an iron-first and second oxide powder to form a compact by a cold hydrostatic pressing and of sintering the compact either in a vacuum or in a non-oxygen atmosphere. The sputtering target with a high thermal conductivity improves the deposition rate by a raised input voltage.
    Type: Grant
    Filed: February 25, 1997
    Date of Patent: September 21, 1999
    Assignee: Korea Institute of Science and Technology
    Inventor: Jong Gab Na