Patents by Inventor Jong-Geun Kim

Jong-Geun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11954890
    Abstract: The present disclosure relates to an apparatus and method for fast refining segmentation for a V-PCC encoder. The apparatus may include a grid segmentation unit segmenting a coordinate space of a point cloud into grid units, and an edge cube search unit searching a cube containing one or more points among the cubes segmented into grid units and containing a segment boundary. The apparatus may also include a surrounding cube search unit searching an edge surrounding cube containing one or more points within a predetermined range from the edge cube, and a smooth score calculation unit calculating smooth scores for all the edge surrounding cubes and all the edge cubes. The apparatus may further include a projection plane index update unit obtaining a normal score based on the calculated smooth scores and updating a projection plane index of each point in the edge cube using the normal score.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: April 9, 2024
    Assignee: Korea Electronics Technology Institute
    Inventors: Yong Hwan Kim, Jieon Kim, JinGang Huh, Jong-geun Park
  • Publication number: 20240098390
    Abstract: The present disclosure provides a mobile communications system line number sheet management device and method. Provided, according to one aspect of the present disclosure, is a line number sheet management device and method, for automating access network-related line number sheet management by automatically collecting and updating line number information, the line number information being collected from a mobile communications base station management server (mobile communications system management server) and a fronthaul management server. Provided, according to another aspect of the present disclosure, is a fronthaul device for: acquiring unique information of a base station by receiving an optical signal from any one of a radio unit (RU) and a digital unit (DU); and transmitting the unique information of the base station to a fronthaul management server.
    Type: Application
    Filed: November 26, 2020
    Publication date: March 21, 2024
    Inventors: Sun Ik LEE, Ka Yoon KIM, Jin Wook LEE, Sang Woo KIM, Jong Min LEE, Myung Hun SONG, Beum Geun CHO
  • Publication number: 20240098263
    Abstract: A device and method for performing fast grid-based refining segmentation (FGRS) for video-based point cloud compression (V-PCC) is proposed. The method may include dividing a space of a three-dimensional (3D) point cloud into multiple grids to derive multiple voxels, searching for filled voxels including one or more points, searching for surrounding voxels which are filled voxels within a certain radius from each of the filled voxels, and searching for edge voxels which are present at a segment edge among all the filled voxels. The method may also include calculating smooth scores for surrounding voxels of each edge voxel and calculating a smooth score sum which is a smooth score for the edge voxel on the basis of the smooth scores of the surrounding voxels of the edge voxel, and updating a projection plane index (PPI) for each individual point in the edge voxel using the calculated smooth score sum.
    Type: Application
    Filed: November 23, 2022
    Publication date: March 21, 2024
    Inventors: Yong Hwan Kim, Yura Kim, Jong-geun Park, Hyun Ho Kim
  • Patent number: 7691945
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1 where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: April 6, 2010
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Patent number: 7534833
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: May 19, 2009
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Publication number: 20070129499
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Application
    Filed: December 28, 2006
    Publication date: June 7, 2007
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Patent number: 6987145
    Abstract: Disclosed is a hetero-branched radial block copolymer suitable as a base polymer of pressure-sensitive adhesives, the hetero-branched radial block having a hetero-branched structure comprised of polystyrene, polyisoprene, and polybutadiene blocks and being represented by (pS-pI)3X-(pB-pI-pS) wherein pS is polystyrene; pI is polyisoprene; pB is polybutadiene; and X is a residue of a tetravalent coupling agent.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: January 17, 2006
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sam-Min Kim, Dai-Seung Choi, Jong-Geun Kim, Hak-Kyung Kim, Tae-Yi Kang
  • Publication number: 20050197463
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Application
    Filed: February 18, 2005
    Publication date: September 8, 2005
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Publication number: 20050131159
    Abstract: Disclosed is a hetero-branched radial block copolymer suitable as a base polymer of pressure-sensitive adhesives, the hetero-branched radial block having a hetero-branched structure comprised of polystyrene, polyisoprene, and polybutadiene blocks and being represented by (pS-pI)3X-(pB-pI-pS) wherein pS is polystyrene; pI is polyisoprene; pB is polybutadiene; and X is a residue of a tetravalent coupling agent.
    Type: Application
    Filed: December 15, 2003
    Publication date: June 16, 2005
    Applicant: KOREA KUMHO PETROCHEMICAL CO. LTD.
    Inventors: Sam-Min Kim, Dai-Seung Choi, Jong-Geun Kim, Hak-Kyung Kim, Tae-Yi Kang
  • Patent number: 6867259
    Abstract: The present invention relates to a bimodal linear block copolymer containing a tapered block and its manufacturing method. The bimodal linear block copolymer includes a hexa-block copolymer of vinyl aromatic block(PS1)-conjugated diene block(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene block(PB2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator, and a tri-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-vinyl aromatic block (PS4). The bimodal linear block copolymer is prepared by adding more than one charge of the initiator, vinyl aromatic monomers and conjugated diene monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can be used for sheets or films, or injection or blow molding products.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: March 15, 2005
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Sam-Min Kim, Dai-Seung Choi, Jong-Hyun Park
  • Patent number: 6849692
    Abstract: The present invention relates to a bimodal linear block copolymer containing a tapered block and its manufacturing method. The bimodal linear block copolymer includes a hepta-block copolymer of vinyl aromatic block(PS1)-conjugated diene block(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4), and a tetra-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator. The bimodal linear block copolymer is prepared by adding several charges of the initiator, vinyl aromatic monomers and conjugated diene monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can be used for sheets or films, or injection or blow molding products.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: February 1, 2005
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Sam-Min Kim, Dai-Seung Choi, Jong-Hyun Park
  • Patent number: 6831134
    Abstract: The present invention relates to a method for preparing a copolymer containing a combined linear and nonlinear block, that is, mikto block, a copolymer prepared from the method, and usages of the copolymer. More particularly, the present invention provides a novel method for preparing a multi-component copolymer by polymerization using a multifunctional compound and one charge of an initiator, and a copolymer having a mikto block including different types of terminal blocks.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: December 14, 2004
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sam-Min Kim, Jong-Geun Kim, Jong-Hyun Park
  • Patent number: 6767960
    Abstract: The present invention is to provide a continuous anion polymerization method for preparing transparent high impact vinyl aromatic polymer comprising the steps of: i) charging and polymerizing vinyl aromatic monomers and initiator to obtain vinyl aromatic polymer in the presence of solvent and polar organic compounds in the first reactor (1a); ii) continuously charging and polymerizing vinyl aromatic monomers and conjugated diene monomers to the vinyl aromatic polymer obtained in the first reactor to obtain tapered vinyl aromatic polymer chain in the presence of organic solvent in the second reactor (1b); iii) continuously charging and polymerizing vinyl aromatic monomers and multi-functional compounds to the vinyl aromatic polymer chain obtained in the second reactor to obtain high impact vinyl aromatic polymer in the presence of organic solvent in the third reactor (1c); and iv) terminating the reaction with terminator and removing the remaining hydrocarbon solvent and unreacted monomers to obtain transparen
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: July 27, 2004
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Hyun Bae, Jong-Hyun Park, Jong-Geun Kim, Dai-Seung Choi, Sam-Min Kim
  • Publication number: 20040024117
    Abstract: The present invention is to provide a continuous anion polymerization method for preparing transparent high impact vinyl aromatic polymer comprising the steps of: i) charging and polymerizing vinyl aromatic monomers and initiator to obtain vinyl aromatic polymer in the presence of solvent and polar organic compounds in the first reactor (1a); ii) continuously charging and polymerizing vinyl aromatic monomers and conjugated diene monomers to the vinyl aromatic polymer obtained in the first reactor to obtain tapered vinyl aromatic polymer chain in the presence of organic solvent in the second reactor (1b); iii) continuously charging and polymerizing vinyl aromatic monomers and multi-functional compounds to the vinyl aromatic polymer chain obtained in the second reactor to obtain high impact vinyl aromatic polymer in the presence of organic solvent in the third reactor (1c); and iv) terminating the reaction with terminator and removing the remaining hydrocarbon solvent and unreacted monomers to obtain transparen
    Type: Application
    Filed: December 17, 2002
    Publication date: February 5, 2004
    Inventors: Jong-Hyun Bae, Jong-Hyun Park, Jong-Geun Kim, Dai-Seung Choi, Sam-Min Kim
  • Publication number: 20030216511
    Abstract: The present invention relates to a bimodal linear block copolymer containing a tapered block and its manufacturing method. The bimodal linear block copolymer includes a hexa-block copolymer of vinyl aromatic block(PS1)-conjugated diene block(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene block(PB2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator, and a tri-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-vinyl aromatic block (PS4). The bimodal linear block copolymer is prepared by adding more than one charge of the initiator, vinyl aromatic monomers and conjugated diene monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can be used for sheets or films, or injection or blow molding products.
    Type: Application
    Filed: March 5, 2003
    Publication date: November 20, 2003
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Sam-Min Kim, Dai-Seung Choi, Jong-Hyun Park
  • Publication number: 20030216512
    Abstract: The present invention relates to a bimodal linear block copolymer containing a tapered block and its manufacturing method. The bimodal linear block copolymer includes a hepta-block copolymer of vinyl aromatic block(PS1)-conjugated diene block(PB1)-tapered block(T1)-vinyl aromatic block(PS2-PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4), and a tetra-block copolymer of vinyl aromatic block(PS3)-conjugated diene block(PB2)-tapered block(T2)-vinyl aromatic block (PS4) as prepared by adding two charges of an initiator. The bimodal linear block copolymer is prepared by adding several charges of the initiator, vinyl aromatic monomers and conjugated diene monomers to acquire transparency, toughness, rigidity and flexibility, and thereby can be used for sheets or films, or injection or blow molding products.
    Type: Application
    Filed: March 5, 2003
    Publication date: November 20, 2003
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Sam-Min Kim, Dai-Seung Choi, Jong-Hyun Park
  • Publication number: 20030158345
    Abstract: The present invention relates to a method for preparing a copolymer containing a combined linear and nonlinear block, that is, mikto block, a copolymer prepared from the method, and usages of the copolymer. More particularly, the present invention provides a novel method for preparing a multi-component copolymer by polymerization using a multifunctional compound and one charge of an initiator, and a copolymer having a mikto block including different types of terminal blocks.
    Type: Application
    Filed: November 12, 2002
    Publication date: August 21, 2003
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sam-Min Kim, Jong-Geun Kim, Jong-Hyun Park
  • Patent number: 6593429
    Abstract: A combined linear and nonlinear polymer (i.e., having a combined linear, branched and radial structure) P+PnD according to the present invention is represented by (P+PnD)−+Li, where P is a polymer of a monovinyl aromatic monomer or a conjugated diene monomer; PD is a nonlinear polymer having a combined linear, branched and radial structure due to a multifunctional compound D bonded to the polymer P; n is an integer ranging from 2 to 10 and represents the average number of bonds between the monovinyl aromatic or conjugated diene polymer P and the multifunctional compound D; and +Li represents a metal ion as a partner of the active anion (P+PnD)−. The combined linear and nonlinear polymer of the present invention, characterized by nonlinearity-related properties (i.e.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: July 15, 2003
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sam-Min Kim, Jong-Geun Kim, Jong-Hyun Park
  • Publication number: 20030096914
    Abstract: A combined linear and nonlinear polymer (i.e., having a combined linear, branched and radial structure) P+PnD according to the present invention is represented by (P+PnD)−+Li, where P is a polymer of a monovinyl aromatic monomer or a conjugated diene monomer; PD is a nonlinear polymer having a combined linear, branched and radial structure due to a multifunctional compound D bonded to the polymer P; n is an integer ranging from 2 to 10 and represents the average number of bonds between the monovinyl aromatic or conjugated diene polymer P and the multifunctional compound D; and +Li represents a metal ion as a partner of the active anion (P+PnD)−. The combined linear and nonlinear polymer of the present invention, characterized by nonlinearity-related properties (i.e.
    Type: Application
    Filed: July 22, 2002
    Publication date: May 22, 2003
    Inventors: Sam-Min Kim, Jong-Geun Kim, Jong-Hyun Park
  • Patent number: 5994476
    Abstract: This invention relates to a process for preparing a block copolymer composition, wherein it comprises following successive steps:a step in which a vinyl aromatic monomer is polymerized in a reactor in the presence of an inert hydrocarbon solvent and organolithium initiator until depletion of the monomer to generate a living polymer; a step in which a conjugated diene monomer is added to the above polymer to synthesize a living diblock copolymer; a step in which a portion of polymerization terminator is added to partially inactivate the living diblock copolymer; steps in which a conjugated diene monomer and aromatic vinyl monomer are sequentially added to generate a mixture of living triblock copolymer and inactivated diblock copolymer; a step in which a polymerization terminator is added to complete the reaction.
    Type: Grant
    Filed: July 14, 1998
    Date of Patent: November 30, 1999
    Assignee: Korea Kumbo Petrochemical Co., Ltd.
    Inventors: Hyeon-Cheol Shin, Jin-Kyung Kim, Jong-Geun Kim