Patents by Inventor Jong-Guw KIM

Jong-Guw KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Flux cleaning method
    Patent number: 9555449
    Abstract: A flux cleaning apparatus for cleaning an object with flux by removing impurities that include flux from the object with flux includes a body, a mount, at least one steam spraying nozzle, and a steam supplying unit. The mount is coupled with the body for mounting the object with flux. The at least one steam spraying nozzle is coupled with the body for spraying steam toward the object with flux on the mount such that the object with flux is cleaned by the steam sprayed from the steam spraying nozzle. The steam supplying unit is coupled with the body and the steam supplying unit supplies steam to the at least one steam spraying nozzle.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: January 31, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Jong-Guw Kim
  • FLUX CLEANING METHOD
    Publication number: 20150258579
    Abstract: A flux cleaning apparatus for cleaning an object with flux by removing impurities that include flux from the object with flux includes a body, a mount, at least one steam spraying nozzle, and a steam supplying unit. The mount is coupled with the body for mounting the object with flux. The at least one steam spraying nozzle is coupled with the body for spraying steam toward the object with flux on the mount such that the object with flux is cleaned by the steam sprayed from the steam spraying nozzle. The steam supplying unit is coupled with the body and the steam supplying unit supplies steam to the at least one steam spraying nozzle.
    Type: Application
    Filed: May 29, 2015
    Publication date: September 17, 2015
    Inventor: Jong-Guw KIM
  • SEMICONDUCTOR PROCESSING APPARATUS USING LASER
    Publication number: 20150017784
    Abstract: Provided is a semiconductor processing apparatus, including a first laser beam irradiation unit having a first variable beam expanding telescope and a first galvanometer scanner transferring a first laser beam having a first wavelength, a second laser beam irradiation unit having a second variable beam expanding telescope and a second galvanometer scanner transferring a second laser beam having a second wavelength, and a telecentric lens.
    Type: Application
    Filed: July 14, 2014
    Publication date: January 15, 2015
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Jong-guw KIM
  • FLUX CLEANING APPARATUS
    Publication number: 20120006364
    Abstract: A flux cleaning apparatus for cleaning an object with flux by removing impurities that include flux from the object with flux includes a body, a mount, at least one steam spraying nozzle, and a steam supplying unit. The mount is coupled with the body for mounting the object with flux. The at least one steam spraying nozzle is coupled with the body for spraying steam toward the object with flux on the mount such that the object with flux is cleaned by the steam sprayed from the steam spraying nozzle. The steam supplying unit is coupled with the body and the steam supplying unit supplies steam to the at least one steam spraying nozzle.
    Type: Application
    Filed: July 5, 2011
    Publication date: January 12, 2012
    Inventor: Jong-Guw KIM