Patents by Inventor Jong Hun JIN

Jong Hun JIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11945744
    Abstract: Disclosed are a method and apparatus for reusing wastewater. The method for reusing wastewater disclosed herein includes: generating a mixed wastewater by mixing multiple types of wastewater (S20); performing a first purification by passing the mixed wastewater through a flocculation-sedimentation unit (S40); performing a second purification by passing an effluent of the flocculation-sedimentation unit through a membrane bioreactor (MBR) (S60); performing a third purification by passing an effluent of the MBR through a reverse-osmosis membrane unit (S80); and reusing an effluent of the reverse-osmosis membrane unit as cooling water or industrial water (S100).
    Type: Grant
    Filed: April 14, 2023
    Date of Patent: April 2, 2024
    Assignees: SAMSUNG ENGINEERING CO., LTD., SAMSUNG ELECTRONICS CO., LTD
    Inventors: Seok Hwan Hong, Dae Soo Park, Seung Joon Chung, Yong Xun Jin, Jae Hyung Park, Jae Hoon Choi, Jae Dong Hwang, Jong Keun Yi, Su Hyoung Cho, Kyu Won Hwang, June Yurl Hur, Je Hun Kim, Ji Won Chun
  • Publication number: 20230115323
    Abstract: A coating composition having excellent non-combustibility and weather resistance. The coating composition may include a silicone modified polyester resin, a curing agent, a pigment, and a flame retardant, wherein the silicone modified polyester resin is prepared by condensation polymerization of a silicone intermediate, an alcohol monomer, and an acid monomer, the alcohol monomer includes a trifunctional or lower aliphatic alcohol and a tetrafunctional aliphatic alcohol in a weight ratio of 80 to 60:20 to 40, the acid monomer includes an aromatic acid and an aliphatic acid in a weight ratio of 20 to 40:80 to 60, and the mixing ratio of the alcohol monomer and the acid monomer is 1.0 to 2.
    Type: Application
    Filed: July 10, 2022
    Publication date: April 13, 2023
    Inventors: Jong Hun JIN, Rag Hee KIM, Jong Chan PARK, Seung Min HONG, Jong Yun PARK, Sung Woo HWANG, Hyuk JEONG