Patents by Inventor Jong Hwa Eom

Jong Hwa Eom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7608901
    Abstract: Disclosed herein is a spin transistor including: a semiconductor substrate having a channel layer formed therein; first and second electrodes which are formed to be spaced apart from each other on the substrate at a predetermined distance along a longitudinal direction of the channel layer; a source and drain which include magnetized ferromagnetic materials and are formed to be spaced apart form each other between the first electrode and the second electrode at a predetermined distance along the longitudinal direction of the channel layer; and a gate which is formed on the substrate between the source and the drain, and adjusts spin orientations of electrons passing through the channel layer, wherein the electrons passing through the channel layer are spin-aligned at a lower side of the source by a stray magnetic field of the source and spin-filtered at a lower side of the drain by a stray field of the drain.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: October 27, 2009
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyun Cheol Koo, Jong Hwa Eom, Suk Hee Han, Joon Yeon Chang, Hyung Jun Kim
  • Publication number: 20080169492
    Abstract: Disclosed herein is a spin transistor including: a semiconductor substrate having a channel layer formed therein; first and second electrodes which are formed to be spaced apart from each other on the substrate at a predetermined distance along a longitudinal direction of the channel layer; a source and drain which include magnetized ferromagnetic materials and are formed to be spaced apart form each other between the first electrode and the second electrode at a predetermined distance along the longitudinal direction of the channel layer; and a gate which is formed on the substrate between the source and the drain, and adjusts spin orientations of electrons passing through the channel layer, wherein the electrons passing through the channel layer are spin-aligned at a lower side of the source by a stray magnetic field of the source and spin-filtered at a lower side of the drain by a stray field of the drain.
    Type: Application
    Filed: July 12, 2007
    Publication date: July 17, 2008
    Applicant: Korea Institute of Science And Technology
    Inventors: Hyun Cheol Koo, Jong Hwa Eom, Suk Hee Han, Joon Yeon Chang, Hyung Jun Kim
  • Patent number: 7307299
    Abstract: A spin transistor having wide ON/OFF operation margin and producing less noise is provided. The spin transistor includes a substrate having a channel, a source, a drain and a gate formed on the substrate. The source and the drain are formed to have magnetization directions perpendicular to the length direction of the channel. The ON/OFF operations of the spin transistor can be controlled by generating a spin-orbit coupling induced magnetic field to have a direction parallel or anti-parallel to the magnetization directions of the source and the drain.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: December 11, 2007
    Assignee: Korea Institute of Science and Technology
    Inventors: Hyun Cheol Koo, Suk Hee Han, Jong Hwa Eom, Joon Yeon Chang, Hyun Jung Yi