Patents by Inventor Jong-Hyun Choung
Jong-Hyun Choung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240057409Abstract: A display device is disclosed that includes a substrate, a thin film transistor, a power line, a pixel electrode, an emission layer, a common electrode, and dummy electrodes. The thin film transistor is disposed on the substrate. The power line is disposed on the substrate and includes a first conductive layer and a second conductive layer having a protrusion part spaced apart from an upper surface of a first conductive layer. The pixel electrode is disposed on the substrate and is electrically connected to a thin film transistor. The emission layer is disposed on the pixel electrode. The common electrode is disposed on the emission layer and contacts the power line. The dummy electrodes are disposed on the same layer as the power line and include the same material as the pixel electrode.Type: ApplicationFiled: March 21, 2023Publication date: February 15, 2024Inventors: YOUNGROK KIM, KYU-SOON PARK, JONG-HYUN CHOUNG
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Publication number: 20230307487Abstract: A display device includes a display area and a pad area on a side of the display area, a plurality of conductive layers on a first substrate in the display area and the pad area and comprising a wiring and a conductive pattern, a via layer on the plurality of conductive layers, a plurality of electrodes on the via layer in the display area and spaced apart from each other, and a light emitting element on at least one of the plurality of electrodes. At least one of the conductive layers includes a first metal layer, a second metal layer on the first metal layer, and a third metal layer on the second metal layer. The second metal layer includes copper (Cu), the third metal layer includes a copper alloy, and a grain size of the third metal layer is smaller than a grain size of the second metal layer.Type: ApplicationFiled: December 21, 2022Publication date: September 28, 2023Applicant: Samsung Display Co., LTD.Inventors: Dong Min LEE, Hyun Ah SUNG, Tae Wook KANG, Young Rok KIM, Kyu Soon PARK, Joon Yong PARK, Hyun Eok SHIN, Jong Hyun CHOUNG
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Publication number: 20230295503Abstract: Embodiments provide an etchant composition that includes about 5.0 to about 20.0 wt % of a persulfate, about 0.01 to about 15.0 wt % of a sulfonic acid, about 0.01 to about 2.0 wt % of a fluorine compound, about 0.01 to about 5.0 wt % of a 4-nitrogen cyclic compound, about 0.01 to about 1.0 wt % of an amino acid including a hydrophobic group having at least two carbon atoms, and water A weight ratio of the amino acid to the 4-nitrogen cyclic compound is in a range of about 1:16 to about 1:60.Type: ApplicationFiled: March 16, 2023Publication date: September 21, 2023Applicant: Samsung Display Co., LTD.Inventors: YOUNGROK KIM, KYU-SOON PARK, Jong-Hyun CHOUNG, Woo Jin CHO, Gyu Po KIM, SUNG MIN KIM, Jae Myeong KIM, Hyun Cheol SHIN, JUN DONG KIM, JUN YOUNG HAWNG
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Publication number: 20230268356Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.Type: ApplicationFiled: January 18, 2023Publication date: August 24, 2023Inventors: Yong-Hwan RYU, Woo Jin CHO, Jong-Hyun CHOUNG, Jae Uoon KIM, Sun-Jin SONG, Hyun Duck CHO
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Publication number: 20230197901Abstract: A display device comprises a via layer disposed on a substrate, a first electrode and a second electrode disposed on the via layer and spaced apart from each other, a first insulating layer disposed on the first electrode and the second electrode, light emitting elements disposed on the first insulating layer and disposed on the first electrode and the second electrode, a bank layer disposed on the first insulating layer and comprising a first opening in which the light emitting elements are disposed and a second opening spaced apart from the first opening, a second insulating layer disposed on the light emitting elements, and a first contact electrode and a second contact electrode disposed on the bank layer, the light emitting elements, and the second insulating layer while being spaced apart from each other.Type: ApplicationFiled: August 5, 2022Publication date: June 22, 2023Applicant: Samsung Display Co., LTD.Inventors: Young Rok KIM, Kyu Soon PARK, Jong Hyun CHOUNG, Woo Jin CHO
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Patent number: 11652111Abstract: A display device includes a data conductive layer disposed on a substrate, a passivation layer disposed on the data conductive layer, a via layer disposed on the passivation layer, and a pixel electrode disposed on the via layer. The data conductive layer includes a data base layer, a data main metal layer disposed on the data base layer, a first data capping layer disposed on the data main metal layer, a second data capping layer disposed on the first data capping layer, and a third data capping layer disposed on the second data capping layer. The passivation layer and the via layer include a pad opening which exposes a portion of the data conductive layer in the pad area. The third data capping layer has a higher etch rate than the first and second data capping layers for a same etchant.Type: GrantFiled: August 31, 2021Date of Patent: May 16, 2023Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Jong Hyun Choung, Jae Uoon Kim, Hyun Ah Sung
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Publication number: 20230116992Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.Type: ApplicationFiled: December 19, 2022Publication date: April 20, 2023Applicant: Samsung Display Co., LTD.Inventors: Jae Uoon KIM, Hong Sick PARK, Jong Hyun CHOUNG
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Patent number: 11600670Abstract: An input sensor of a display device includes: a sensing electrode on a base insulating layer and overlapping a sensing region; and a signal line electrically connected to the sensing electrode and overlapping the non-sensing region, and including: a first conductive layer on the base insulating layer and having a first reflectance, a first conductivity, and a first thickness; a second conductive layer having a second reflectance lower than the first reflectance, a second conductivity lower than the first conductivity, and a second thickness smaller than the first thickness, wherein the second conductive layer is on and in contact with the first conductive layer; and a third conductive layer between the base insulating layer and the first conductive layer, in contact with each of the base insulating layer and the first conductive layer, wherein the third conductive layer contains a material different from that of the second conductive layer.Type: GrantFiled: August 2, 2021Date of Patent: March 7, 2023Assignee: Samsung Display Co., Ltd.Inventors: Jong-Hyun Choung, Jaeuoon Kim
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Patent number: 11594561Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.Type: GrantFiled: October 20, 2020Date of Patent: February 28, 2023Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Yong-Hwan Ryu, Woo Jin Cho, Jong-Hyun Choung, Jae Uoon Kim, Sun-Jin Song, Hyun Duck Cho
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Patent number: 11557614Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.Type: GrantFiled: August 26, 2020Date of Patent: January 17, 2023Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Jae Uoon Kim, Hong Sick Park, Jong Hyun Choung
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Publication number: 20220406817Abstract: A display device includes conductive layers including wires and conductive patterns in a display area and a pad area, a via layer on the conductive layers, a first electrode and a second electrode on the via layer in the display area and spaced apart from each other, a first insulating layer on the first electrode and the second electrode, light emitting elements on the first electrode and the second electrode spaced apart from each other on the first insulating layer, and a first connection electrode on the first electrode and electrically contacting the light emitting elements, and a second connection electrode on the second electrode and electrically contacting the light emitting elements, each of the conductive layers includes a first metal layer and a second metal layer on the first metal layer, and the second metal layer contains copper and has a grain size of about 155 nm or less.Type: ApplicationFiled: February 15, 2022Publication date: December 22, 2022Applicant: Samsung Display Co., LTD.Inventors: Joon Yong PARK, Gyung Min BAEK, Shin Il CHOI, Do Keun SONG, Young Rok KIM, Jong Hyun CHOUNG
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Publication number: 20220178016Abstract: A deposition apparatus includes a chamber, a deposition source disposed in the chamber, a mask assembly, and a base substrate disposed on the mask assembly. The mask assembly includes a frame including frame openings, a mask disposed on the frame and including deposition holes, and a welding stick disposed on the mask. A welding groove is disposed along an edge of the frame and has a depth in the thickness direction of the frame. The welding stick overlaps the welding groove.Type: ApplicationFiled: September 17, 2021Publication date: June 9, 2022Applicant: Samsung Display Co., Ltd.Inventors: JI-HEE SON, YOUNGMIN MOON, JAEUOON KIM, SEUNGYONG SONG, SUNGSOON IM, JONG-HYUN CHOUNG, HYUNMIN CHO
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Publication number: 20220157856Abstract: A display device includes a data conductive layer disposed on a substrate, a passivation layer disposed on the data conductive layer, a via layer disposed on the passivation layer, and a pixel electrode disposed on the via layer. The data conductive layer includes a data base layer, a data main metal layer disposed on the data base layer, a first data capping layer disposed on the data main metal layer, a second data capping layer disposed on the first data capping layer, and a third data capping layer disposed on the second data capping layer. The passivation layer and the via layer include a pad opening which exposes a portion of the data conductive layer in the pad area. The third data capping layer has a higher etch rate than the first and second data capping layers for a same etchant.Type: ApplicationFiled: August 31, 2021Publication date: May 19, 2022Applicant: Samsung Display Co., LTD.Inventors: Jong Hyun CHOUNG, Jae Uoon KIM, Hyun Ah SUNG
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Publication number: 20220123055Abstract: An input sensor of a display device includes: a sensing electrode on a base insulating layer and overlapping a sensing region; and a signal line electrically connected to the sensing electrode and overlapping the non-sensing region, and including: a first conductive layer on the base insulating layer and having a first reflectance, a first conductivity, and a first thickness; a second conductive layer having a second reflectance lower than the first reflectance, a second conductivity lower than the first conductivity, and a second thickness smaller than the first thickness, wherein the second conductive layer is on and in contact with the first conductive layer; and a third conductive layer between the base insulating layer and the first conductive layer, in contact with each of the base insulating layer and the first conductive layer, wherein the third conductive layer contains a material different from that of the second conductive layer.Type: ApplicationFiled: August 2, 2021Publication date: April 21, 2022Inventors: Jong-Hyun CHOUNG, Jaeuoon KIM
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Publication number: 20210327927Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.Type: ApplicationFiled: October 20, 2020Publication date: October 21, 2021Inventors: YONG-HWAN RYU, Woo Jin Cho, Jong-Hyun Choung, Jae Uoon Kim, Sun-Jin Song, Hyun Duck Cho
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Publication number: 20210249451Abstract: A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.Type: ApplicationFiled: August 26, 2020Publication date: August 12, 2021Applicant: Samsung Display Co., LTD.Inventors: Jae Uoon KIM, Hong Sick PARK, Jong Hyun CHOUNG
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Patent number: 10825844Abstract: A transistor array substrate includes a substrate (having a first trench), a gate electrode (in the first trench), an insulating film, a gate line, a data line, a source electrode, and a drain electrode. The insulating film includes second, third, fourth, fifth, and sixth trenches. The gate line is in the second trench and is not parallel to the data line. The data line includes a first section and a second section that are separated by the gate line and respectively in the third and fourth trenches. The source electrode and the drain electrode are respectively in the fifth and sixth trenches. The source electrode is electrically connected to the data line. The gate electrode is electrically connected to the gate line.Type: GrantFiled: May 28, 2019Date of Patent: November 3, 2020Assignee: Samsung Display Co., Ltd.Inventors: Jong Hyun Choung, Jae Uoon Kim
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Publication number: 20200243563Abstract: A transistor array substrate includes a substrate (having a first trench), a gate electrode (in the first trench), an insulating film, a gate line, a data line, a source electrode, and a drain electrode. The insulating film includes second, third, fourth, fifth, and sixth trenches. The gate line is in the second trench and is not parallel to the data line. The data line includes a first section and a second section that are separated by the gate line and respectively in the third and fourth trenches. The source electrode and the drain electrode are respectively in the fifth and sixth trenches. The source electrode is electrically connected to the data line. The gate electrode is electrically connected to the gate line.Type: ApplicationFiled: May 28, 2019Publication date: July 30, 2020Inventors: Jong Hyun Choung, Jae Uoon KIM
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Patent number: 10613370Abstract: There is provided a display device. The display device includes a first substrate, a second substrate that faces the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. One of the first substrate and the second substrate includes a base substrate and a light blocking pattern disposed on a surface that faces the other surface of both surfaces of the base substrate, the light blocking pattern exposing a part of the base substrate. The light blocking pattern includes a semi-transmission reflective layer a disposed on the base substrate, a phase matching layer disposed on the semi-transmission reflective layer, and a reflective metal layer disposed on the phase matching layer. The phase matching layer and the reflective metal layer include materials having substantially the same etching rate.Type: GrantFiled: June 16, 2017Date of Patent: April 7, 2020Assignee: Samsung Display Co., Ltd.Inventors: Jong Hyun Choung, Hong Sick Park, Seung Bae Kang, Ki Tae Kim, Joon Woo Bae, Hee Sung Yang
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Patent number: 10564549Abstract: A method of forming a thin film pattern includes providing a thin film on a substrate, providing a photoresist on the thin film, forming a first photoresist pattern having a first packing density by exposing and developing the photoresist, etching the thin film by using the first photoresist pattern as a mask, processing the first photoresist pattern to convert the first photoresist pattern into a second photoresist pattern having a second packing density, which is lower than the first packing density, and stripping the second photoresist pattern by spraying steam onto the second photoresist pattern.Type: GrantFiled: August 31, 2017Date of Patent: February 18, 2020Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Beung Hwa Jeong, Jong Hyun Choung, Sung Chul Kim