Patents by Inventor Jong Hyung Ahn

Jong Hyung Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5843789
    Abstract: Improved porous materials useful in blotting analyses of proteinaceous and genomic matter are prepared by treating porous substrates with a gas plasma containing at least one monomer. Thus, a porous sheet-like substrate is modified by means of a deposit of a plasma polymerizate on at least one of its surfaces, whereby this modified surface exhibits reduced nonspecific binding of chemical probes in a blotting analysis. By means of a controlled deposition of the plasma polymer at a plasma composite parameter W/FM of less than 1.0.times.10.sup.9 Joules/kilogram, improved porous materials are obtained having increased signal-to-background ratios and enhanced sensitivities in genomic analyses.
    Type: Grant
    Filed: May 16, 1995
    Date of Patent: December 1, 1998
    Assignee: NeoMecs Incorporated
    Inventors: Hiroshi Nomura, Jong Hyung Ahn