Abstract: An osseo-integrated dental implant comprising a polished band and a protuberance is disclosed. The polished band is located between a one-third and a two-third position of an overall length of a root of the implant as measured from an upper end of the root and polished in a circumferential direction to have a surface roughness of below 0.5 ?m. A width of the polished band is 0.5 mm to 1.0 mm when the overall length of the root is below 8 mm, and 0.5 mm to 1.2 mm when the overall length of the root is between 9 mm and 12 mm, and 0.5 mm to 1.5 mm when the overall length of the root is above 13 mm. An external diameter of the polished band is smaller than an external diameter of a ridge of screw located at the upper portion of the root. A protuberance has a roughness same as the polished band, protruded from the polished band with a shape of a ridge of screw.

Abstract: An osseo-integrated dental implant comprising a band is disclosed. The band is spaced apart from an upper end of a root of the implant at a predetermined distance and which is highly polished in a circumferential direction. Preferably, the band is concavely formed and is located between one-third position and two-third position of overall length of the root from the upper end of the root of the implant. When there is a failure of treatment caused by loss of surrounding bone of cervical portion of the implant, the implant with peri-implantitis in progress can be easily treated and then the longevity of the implant can be lengthened.