Patents by Inventor Jong-Joon Park

Jong-Joon Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9048236
    Abstract: A semiconductor device includes an interlayer insulating film formed on a substrate, the insulating layer including a trench. A gate insulating layer is formed on a bottom surface of the trench and a reaction prevention layer is formed on the gate insulating layer on the bottom surface of the trench. A replacement metal gate structure is formed on the reaction prevention layer of the trench to fill the trench.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: June 2, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ju-Youn Kim, Jong-Mil Youn, Jong-Joon Park, Kwang-Yong Jang, Jun-Sun Hwang
  • Publication number: 20140103441
    Abstract: A semiconductor device includes an interlayer insulating film formed on a substrate, the insulating layer including a trench. A gate insulating layer is formed on a bottom surface of the trench and a reaction prevention layer is formed on the gate insulating layer on the bottom surface of the trench. A replacement metal gate structure is formed on the reaction prevention layer of the trench to fill the trench.
    Type: Application
    Filed: July 22, 2013
    Publication date: April 17, 2014
    Inventors: Ju-Youn Kim, Jong-Mil Youn, Jong-Joon Park, Kwang-Yong Jang, Jun-Sun Hwang