Abstract: The present invention introduces a plasma etching method and apparatus. The plasma etching method may include forming a photoresist pattern on a target etching layer, hardening the surface of the photoresist pattern by exposing to a first plasma generated from a first discharge gas containing a reforming gas including carbon (C) and sulfur (S) and sequentially annealing, and etching the target etching layer with a second plasma generated from a second discharge gas using the surface-hardened photoresist pattern as a mask.

Abstract: A display defect detection circuit of a display defect detection system includes a preprocessing circuit configured to receive a capture image of a test pattern, displayed by a display panel, as a panel image including target Mura having a repetitive characteristic and preprocess the panel image to output a preprocessing image and a Mura detection circuit configured to decrease a total size of the preprocessing image on the basis of a size of the target Mura to generate a resize image, detect an edge component in the resize image to generate an edge map image having feature values, remove a feature value of a non-repetitive type among the feature values of the edge map image to generate a feature map image, and detect a display position of the target Mura on the basis of a final feature value of the target Mura calculated based on the feature map image.

Abstract: A display defect detection system and a detection method thereof are disclosed. A display defect detection system includes a preprocessing circuit receiving a capture image of a test pattern, displayed by a display panel, as a panel image including diagonal Mura and preprocessing the panel image to output a preprocessing image and a Mura detection circuit calculating a final feature value of the diagonal Mura by multiplying a first feature value, in which a luminance difference of the diagonal Mura is reflected, by a second feature value in which a shape ratio of the diagonal Mura is reflected, on the basis of an edge map of the preprocessing image, and detecting a display position of the diagonal Mura on the basis of the final feature value of the diagonal Mura.

Abstract: A display defect detection circuit of a display defect detection system includes a preprocessing circuit configured to receive a capture image of a test pattern, displayed by a display panel, as a panel image including target Mura having a repetitive characteristic and preprocess the panel image to output a preprocessing image and a Mura detection circuit configured to decrease a total size of the preprocessing image on the basis of a size of the target Mura to generate a resize image, detect an edge component in the resize image to generate an edge map image having feature values, remove a feature value of a non-repetitive type among the feature values of the edge map image to generate a feature map image, and detect a display position of the target Mura on the basis of a final feature value of the target Mura calculated based on the feature map image.