Abstract: The present invention relates to a vertical continuous plating device enabling to control plating deviation based on a thickness difference of to-be-plated objects. The present a invention aims to allow the to-be-plated objects within plating tank to be gripped in an angularly adjustable manner, and to maximize an e-duct effect for the to-be-plated objects within the plating tank through a forward/backward and left/right movement of the to-be-plated objects, thereby improving the manufacturing yield and quality and increasing space utilization compared to the same space due to a reduction in the size of the plating tank.

Abstract: An apparatus for fabricating a liquid crystal display device includes a controller for providing nitrogen (N2) gas at a constant pressure, a plurality of dispensers receiving the nitrogen gas from the controller, each of the dispensers dotting a silver paste at two or more regions of a first substrate, and a plurality of flow control valves each introducing the nitrogen gas into each of the plurality of dispensers at the same pressure.

Abstract: An apparatus for fabricating a liquid crystal display device includes a controller for providing nitrogen (N2) gas at a constant pressure, a plurality of dispensers receiving the nitrogen gas from the controller, each of the dispensers dotting a silver paste at two or more regions of a first substrate, and a plurality of flow control valves each introducing the nitrogen gas into each of the plurality of dispensers at the same pressure.