Patents by Inventor Jong Kuk HAN

Jong Kuk HAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for distributing gas and apparatus for processing substrate including the same
    Patent number: 11293097
    Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.
    Type: Grant
    Filed: October 4, 2019
    Date of Patent: April 5, 2022
    Inventors: Suk Chul Jung, Young-Rok Kim, Jong Kuk Han
  • APPARATUS FOR DISTRIBUTING GAS AND APPARATUS FOR PROCESSING SUBSTRATE INCLUDING THE SAME
    Publication number: 20200032393
    Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.
    Type: Application
    Filed: October 4, 2019
    Publication date: January 30, 2020
    Inventors: Suk Chul JUNG, Young-Rok KIM, Jong Kuk HAN
  • APPARATUS FOR DISTRIBUTING GAS AND APPARATUS FOR PROCESSING SUBSTRATE INCLUDING THE SAME
    Publication number: 20170121815
    Abstract: Disclosed is an apparatus for distributing gas which is capable of uniformly injecting processing gas into a plurality of gas passages being communicated with a plurality of gas distribution holes, and an apparatus for processing substrate including the same, wherein the apparatus for distributing gas may include a body including a plurality of gas passages connected with a plurality of gas distribution holes for distributing processing gas; and at least one gas injection module connected with at least one lateral surface of the body and respectively communicated with the plurality of gas passages, wherein the gas injection module firstly buffers the processing gas supplied from the external, secondly buffers the firstly buffered processing gas, and injects the buffered processing gas into the plurality of gas passages.
    Type: Application
    Filed: April 3, 2015
    Publication date: May 4, 2017
    Inventors: Suk Chul JUNG, Young-Rok KIM, Jong Kuk HAN