Abstract: Disclosed is a chemical-mechanical polishing composition used in a process for chemical-mechanical polishing of silicon oxide layer having severe unevenness with large step-height. The composition includes abrasive particles of metal oxide; and at least one compound(s) selected from the group consisting of amino alcohols, hydroxycarboxylic acid having at least 3 of the total number of carboxylic acid group(s) and hydroxyl group(s) or their salts, or a mixture thereof. A polymeric organic acid, a preservative, a lubricant and a surfactant may be further contained. The composition shortens the vapor-deposition time of a layer to be polished, saves the raw material to be vapor-deposited, shortens the chemical-mechanical polishing time, and saves the slurry employed.

Abstract: A high frequency heat treatment method for a fine bottom-closed hole includes preparing a coil so as to be completely inserted into the fine bottom-closed hole, preparing a core for controlling a magnetic flux within the coil such that the core protrudes from upper and lower sides of the coil, heat-treating a target part of the fine bottom-closed hole under conditions of a heating time of 2˜3 seconds, an output power of 200˜300 kW, a quenching time of 3˜5 seconds, a positive electrode voltage of 4 ˜8 kV, and a positive electrode current of 2.0˜4.5 A, and quenching the heat-treated part of the fine bottom-closed hole with cooling nozzles fixed around the heat-treated part such that a sufficient amount of cooling water is injected uniformly over the whole heated part with a sufficient pressure via the cooling nozzles.

Abstract: The present invention relates to a novel slurry composition for copper polishing, comprising zeolite which is a porous crystalline material for CMP of copper film in a semiconductor manufacturing process. The slurry composition according to the present invention comprises zeolite, an oxidant and a polish promoting agent and may further comprise a corrosion inhibitor, a surfactant, an aminoalcohol, an antiseptic and a dispersion agent and pH is in a range of 1 to 7. The zeolite slurry according to the present invention has advantages of absorbing and removing metal cation generated in CMP process by using zeolite and having a low level of scratches as the zeolite has micropores therein and thus its hardness is low. The slurry composition using zeolite of the present invention is usable to both first and second step polishing of copper damascene process and particularly useful as the first step polishing slurry for copper.

Abstract: To manufacture a flange for a compressor with a relief groove by using powder metallurgy in order to prevent deformation of the compressor in operation, powder material for the flange is charged into a mold; an ablative member having a melting point lower than that of the powder material is positioned at a place where a relief groove is to be formed; the flange is formed by compressing the powder material and the ablative member; and the formed flange is sintered at a temperature between the melting points of the power material and the ablative member so as to melt and remove the ablative member.

Abstract: The present invention relates to a carrier of a planetary gear set of an automatic transmission. In a carrier of a planetary gear set of an automatic transmission that includes a boss part having a spline in an inner surface of the center, and a flange part coupled with the boss part and supporting a pinion, there is provided a carrier of a planetary gear set of an automatic transmission that is characterized in that the portions of the boss part except for a center portion in which the spline is formed are formed in a circular plate shape, and a plurality of bridges are formed on an upper surface of the flange portion at regular intervals, and a lower surface of the boss part is blazing-coupled with an upper surface of the bridge of the flange part, and a pinion installation space is formed between the neighboring bridges.

Abstract: To manufacture a flange for a compressor with a relief groove by using powder metallurgy in order to prevent deformation of the compressor in operation, powder material for the flange is charged into a mold; an ablative member having a melting point lower than that of the powder material is positioned at a place where a relief groove is to be formed; the flange is formed by compressing the powder material and the ablative member; and the formed flange is sintered at a temperature between the melting points of the power material and the ablative member so as to melt and remove the ablative member.