Patents by Inventor Jong-Min Yun
Jong-Min Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240125908Abstract: A method for manufacturing a LiDAR device is proposed. The method may include providing a LiDAR module including a laser emitting module and a laser detecting module to a target region. The method may also include adjusting, on the basis of first detecting data obtained from the laser detecting module, a relative position of a detecting optic module with respect to the laser detecting module. The method may further include adjusting, on the basis of image data obtained from at least one image sensor, a relative position of an emitting optic module with respect to the laser emitting module.Type: ApplicationFiled: December 21, 2023Publication date: April 18, 2024Inventors: Chan M LIM, Dong Kyu KIM, Chang Mo JEONG, Hoon Il JEONG, Eunsung KWON, Junhyun JO, Bumsik WON, Suwoo NOH, Sang Shin BAE, Seong Min YUN, Jong Hyun YIM
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Patent number: 11944797Abstract: A device for adjusting the tightening angle of a needle safety protector is proposed. The device is configured to provide an injection needle in an integrated state with a needle hub for preventing reuse of the injection needle and to fasten the needle hub to a needle safety protector that is disposed of in a folded state after use, a fastening structure is improved such that rotation is possible by a predetermined angle when the needle safety protector is rotated. Accordingly, an injection is safely performed by correcting the injection needle to the reference direction. In addition, even when a syringe is assembled by deviating from a reference angle during the mass production with the automatic line, the wrong angle is corrected in use.Type: GrantFiled: March 5, 2021Date of Patent: April 2, 2024Inventors: Hee Min Cho, Mi Heui Cho, Jong Deok Yun, Jae Cheon Kim
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Patent number: 11935296Abstract: Provided is an apparatus for online action detection, the apparatus including a feature extraction unit configured to extract a chunk-level feature of a video chunk sequence of a streaming video, a filtering unit configured to perform filtering on the chunk-level feature, and an action classification unit configured to classify an action class using the filtered chunk-level feature.Type: GrantFiled: August 25, 2021Date of Patent: March 19, 2024Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Jin Young Moon, Hyung Il Kim, Jong Youl Park, Kang Min Bae, Ki Min Yun
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Publication number: 20230380192Abstract: An semiconductor device may include a first conductive line; a second conductive line disposed to be spaced apart from the first conductive line; a variable resistance layer disposed between the first conductive line and the second conductive line; and an electrode layer which is disposed at least one of a first location between the first conductive lines and the variable resistance layer, or a second location between the variable resistance layer and the second conductive lines and includes a thickness dependent metal-insulator transition (TDMIT) material that exhibits an electrical resistance depending on a thickness of the TDMIT material.Type: ApplicationFiled: December 14, 2022Publication date: November 23, 2023Inventor: Jong Min YUN
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Patent number: 11795549Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: March 7, 2022Date of Patent: October 24, 2023Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Patent number: 11732364Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: January 12, 2022Date of Patent: August 22, 2023Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20220190250Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: March 7, 2022Publication date: June 16, 2022Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Patent number: 11335854Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: March 27, 2020Date of Patent: May 17, 2022Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20220149283Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: January 12, 2022Publication date: May 12, 2022Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Patent number: 10727409Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: GrantFiled: August 22, 2017Date of Patent: July 28, 2020Assignee: LG INNOTEK CO., LTD.Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
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Publication number: 20200227640Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: March 27, 2020Publication date: July 16, 2020Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Publication number: 20190259951Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.Type: ApplicationFiled: August 22, 2017Publication date: August 22, 2019Inventors: Dong Mug SEONG, Jong Min YUN, Su Hyeon CHO, Hae Sik KIM, Tae Hoon HAN, Hyo Won SON, Sang Yu LEE, Sang Beum LEE
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Publication number: 20150063778Abstract: An electronic device and a method thereof that receive an image photographed in a multi-angle and that generate a file are provided. The method includes detecting at least one second electronic device located within a preset distance of a first electronic device; receiving information associated with a second image from the detected at least one second electronic device; and displaying the second image and a first image. The first image is photographed in an angle of the first electronic device, and the second image is photographed in an angle of the detected at least one second electronic device.Type: ApplicationFiled: August 1, 2014Publication date: March 5, 2015Inventors: Hyuk-Min KWON, Young-Gyu Kim, Jong-Min Yun
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Patent number: 8588530Abstract: A method of detecting a region having a specific shape in a camera is provided. The method includes processing input image data in a camera and detecting the region having the specific shape. The method includes calculating gradation differences between a central pixel and respective peripheral pixels in each of local regions of an image frame, comparing an average gradation difference with each of the gradation differences and obtaining local gradient pattern (LGP) values based on a comparison result in each of the local regions, and detecting the region having the specific shape from the image frame using the LGP values obtained from the respective local regions.Type: GrantFiled: July 15, 2011Date of Patent: November 19, 2013Assignees: Samsung Techwin Co., Ltd., Postech Academy-Industry FoundationInventors: Seoung-seon Jeson, Dae-Jin Kim, Bong-jin Jun, Jong-min Yun
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Publication number: 20120014607Abstract: A method of detecting a region having a specific shape in a camera is provided. The method includes processing input image data in a camera and detecting the region having the specific shape. The method includes calculating gradation differences between a central pixel and respective peripheral pixels in each of local regions of an image frame, comparing an average gradation difference with each of the gradation differences and obtaining local gradient pattern (LGP) values based on a comparison result in each of the local regions, and detecting the region having the specific shape from the image frame using the LGP values obtained from the respective local regions.Type: ApplicationFiled: July 15, 2011Publication date: January 19, 2012Applicants: POSTECH ACADEMY-INDUSTRY FOUNDATION, SAMSUNG TECHWIN CO., LTD.Inventors: Seoung-seon JESON, Dai-Jin KIM, Bong-jin JUN, Jong-min YUN
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Publication number: 20090171578Abstract: A navigation system and method for providing turn-by-turn instructions for guiding a user along a route. The navigation system includes a global positioning system (GPS) receiving module for determining position information of the navigation system, a display unit for displaying information to guide a user along a route, a storage unit for storing map information, and a controller for processing the position information and the map information in order to concurrently provide a next turn-by-turn instruction and one or more subsequent turn-by-turn instructions to the user via the display unit.Type: ApplicationFiled: December 26, 2008Publication date: July 2, 2009Inventors: Hyun-Seok Kim, Kun-Sik Lee, Jeong-Hee Ahn, Jong-Min Yun, Jae-Hee Shim, Suk-Jin Chang, Hyung-Nam Lee, Myoung-Hoon Jeon