Abstract: Methods of depositing a protective coating of a silicon-containing or metallic material onto a semiconductor substrate include sputtering such material from an electrode onto a semiconductor substrate in a plasma processing chamber. The protective material can be deposited onto a multi-layer mask overlying a low-k material and/or onto the low-k material. The methods can be used in dual damascene processes to protect the mask and enhance etch selectivity, to protect the low-k material from carbon depletion during resist strip processes, and/or protect the low-k material from absorption of moisture.

Abstract: Methods of depositing a protective coating of a silicon-containing or metallic material onto a semiconductor substrate include sputtering such material from an electrode onto a semiconductor substrate in a plasma processing chamber. The protective material can be deposited onto a multi-layer mask overlying a low-k material and/or onto the low-k material. The methods can be used in dual damascene processes to protect the mask and enhance etch selectivity, to protect the low-k material from carbon depletion during resist strip processes, and/or protect the low-k material from absorption of moisture.

Abstract: A plate-shaped heater having a PTC temperature sensor to sense a temperature of the plate-shaped heater, and a steam cooking apparatus including the same. The plate-shaped heater includes an insulating substrate, a heating element formed of a resistor pattern-printed on the insulating substrate to generate heat, and a PTC temperature sensor to sense a heating temperature of the heating element. The PTC temperature sensor is pattern-printed on the insulating substrate, and therefore, has the effect of eliminating the risk of unintentional separation thereof, and achieving a simplified manufacturing process and reduced manufacturing costs. The PTC temperature sensor is disposed on the insulating substrate in an axis of direction having a wide distance between neighboring temperature contour lines, to achieve accurate temperature sensing capability thereof.

Abstract: The steam cooking apparatus includes a cooking compartment and a steam generating unit disposed at the outside of the cooking compartment and adapted to generate steam to be supplied into the cooking compartment. The steam generating unit includes a steam generating container to receive water therein, the steam generating container having a partitioned steam generating space, and a plate-shaped heater to heat the water received in the steam generating container. The plate-shaped heater includes a plurality of heating elements having different outputs from one another, thereby having the effect of enabling rapid and proper supply of steam required to cook different foods. The steam generating container is provided with an intercepting member, which divides the steam generating container into a water level sensing chamber and a steam generating chamber. The intercepting member prevents fluctuation of water level between the steam generating chamber and the water level sensing chamber.

Abstract: An apparatus and method for controlling cooling time of a microwave oven that is capable of controlling an initial cooling time, which is given to secure stable operational characteristics of a sensor, when sensor-based automatic cooking is performed, thereby reducing total cooking time. The cooling time control method includes determining whether sensor-based automatic cooking is performed, when the sensor-based automatic cooking is performed, operating a cooling fan to perform cooling operation such that a sensor is cooled, sensing an output value of the sensor, when the cooling operation is performed, to calculate a change of the sensor output value, and comparing the calculated change of the sensor output value with a predetermined reference value, and, when the change of the sensor output value exceeds the predetermined reference value, controlling cooling time based on the change of the sensor output value.