Patents by Inventor Jong Won Yun

Jong Won Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210096458
    Abstract: Disclosed is a pellicle for extreme ultraviolet (EUV) lithography, with a core layer formed on a pellicle frame, the core layer comprising: a first layer; and a second layer. The first layer includes silicon. The second layer includes one among a metal silicide that has silicon with metal, a silicon compound that has silicon with a light element, and a metal silicide compound that has silicon with metal and a light element. With this, the pellicle is improved in mechanical, thermal and chemical stability with minimum loss of optical characteristics.
    Type: Application
    Filed: December 27, 2019
    Publication date: April 1, 2021
    Applicant: S&S TECH Co., Ltd.
    Inventors: Kee-Soo NAM, Chang-Hun LEE, Jong-Won YUN, Chul-Kyun PARK
  • Publication number: 20210090895
    Abstract: A substrate processing apparatus includes: a substrate holding unit configured to hold and rotate a substrate; an etching unit configured to etch a surface of a substrate by discharging a processing liquid to the substrate rotated by the substrate holding unit; and a control unit configured to control an etching amount by the etching unit. In the substrate processing apparatus, the control unit controls an etching amount at each position on the surface of the substrate based on information upon a characteristic of a surface processing to be performed on the substrate by a post-processing apparatus which is configured to perform a post-processing after a substrate processing by the substrate processing apparatus.
    Type: Application
    Filed: December 3, 2020
    Publication date: March 25, 2021
    Inventor: Jong Won Yun
  • Publication number: 20190304811
    Abstract: A substrate processing apparatus 10 includes processing units 16 each configured to process a wafer W; tanks 102 and 202 each configured to store a processing liquid; processing liquid supply units 103 and 203 each configured to supply the processing liquid into the processing unit 16; drain units 110 and 210 each configured to drain the processing liquid; supplement units 112 and 212 each configured to supplement the tanks 102 and 202 with the processing liquids; and a control unit 18. The control unit 18 is configured to perform a process job by controlling the processing liquid supply units 103 and 203 and the processing unit 16 and perform, when predetermined liquid exchange conditions are met during the performing of the process job, a liquid exchange processing in parallel with the process job by controlling the drain units 110 and 210 and the supplement units 112 and 212.
    Type: Application
    Filed: April 1, 2019
    Publication date: October 3, 2019
    Inventors: Go Ayabe, Kouji Takuma, Ryo Manabe, Jong Won Yun
  • Patent number: 10381980
    Abstract: The apparatus comprises a first coupler configured to receive two output signals, having 180° phase difference, outputted from a first differential generator as two input signals, and output a first voltage signal generated by adding the two input signals and a second voltage signal corresponding to subtraction of the two input signals, a second coupler configured to receive two output signals, having 180° phase difference, outputted from a second differential generator as two input signals, and output a third voltage signal generated by adding the two input signals and a fourth voltage signal corresponding to subtraction of the two input signals, a coupling network connected to the first differential generator and the second differential generator and a third coupler configured to output a signal generated by adding the voltage signal outputted from the first coupler and corresponding voltage signal outputted from the second coupler.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: August 13, 2019
    Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Jae Sung Rieh, Jong Won Yun
  • Publication number: 20170257062
    Abstract: The apparatus comprises a first coupler configured to receive two output signals, having 180° phase difference, outputted from a first differential generator as two input signals, and output a first voltage signal generated by adding the two input signals and a second voltage signal corresponding to subtraction of the two input signals, a second coupler configured to receive two output signals, having 180° phase difference, outputted from a second differential generator as two input signals, and output a third voltage signal generated by adding the two input signals and a fourth voltage signal corresponding to subtraction of the two input signals, a coupling network connected to the first differential generator and the second differential generator and a third coupler configured to output a signal generated by adding the voltage signal outputted from the first coupler and corresponding voltage signal outputted from the second coupler.
    Type: Application
    Filed: December 31, 2014
    Publication date: September 7, 2017
    Inventors: Jae Sung RIEH, Jong Won YUN
  • Patent number: 9692355
    Abstract: An oscillator for high-frequency signal generation is disclosed. Provided according to the present invention is an oscillator for high-frequency signal generation comprising: a first transistor comprising a first collector for receiving a power supply voltage from a load, a first base connected to a ground, and a first emitter connected to the first base; and a second transistor comprising a second collector for receiving a power supply voltage from the load, a second base connected to a ground, and a second emitter connected to the second base, the oscillator having a common-base cross-coupled structure in which the first collector and the second emitter are cross-coupled and the second collector and the first emitter are cross-coupled.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: June 27, 2017
    Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Jae Sung Rieh, Jong Won Yun, Nam Hyung Kim
  • Publication number: 20160294324
    Abstract: An oscillator for high-frequency signal generation is disclosed. Provided according to the present invention is an oscillator for high-frequency signal generation comprising: a first transistor comprising a first collector for receiving a power supply voltage from a load, a first base connected to a ground, and a first emitter connected to the first base; and a second transistor comprising a second collector for receiving a power supply voltage from the load, a second base connected to a ground, and a second emitter connected to the second base, the oscillator having a common-base cross-coupled structure in which the first collector and the second emitter are cross-coupled and the second collector and the first emitter are cross-coupled.
    Type: Application
    Filed: December 10, 2014
    Publication date: October 6, 2016
    Inventors: Jae Sung RIEH, Jong Won YUN, Nam Hyun KIM
  • Publication number: 20160111296
    Abstract: A substrate processing apparatus comprises: a substrate holding unit configured to hold and rotate a substrate; an etching unit configured to etch a surface of a substrate by discharging a processing liquid to the substrate rotated by the substrate holding unit; and a control unit configured to control an etching amount by the etching unit. In the substrate processing apparatus, the control unit controls an etching amount at each position on the surface of the substrate based on information upon a characteristic of a surface processing to be performed on the substrate by a post-processing apparatus which is configured to perform a post-processing after a substrate processing by the substrate processing apparatus.
    Type: Application
    Filed: October 15, 2015
    Publication date: April 21, 2016
    Inventor: Jong Won Yun