Abstract: Disclosed is a substrate tray which facilitates to realize a large size, and to prevent defects caused by sagging, and a substrate processing apparatus comprising the same, wherein the substrate tray may include a plurality of straps for supporting a plurality of substrates arranged in a first axis direction; and a support frame connected with the straps in a second axis direction being perpendicular to the first axis direction, wherein a length in each of the straps is larger than a length of the substrate with respect to the second axis direction.

Abstract: A dry etching apparatus is disclosed, which is capable of forming a uniform pattern in a substrate surface, the dry etching apparatus for etching at least one substrate through the use of plasma, comprising the at least one substrate placed on a tray inside a chamber; a susceptor, provided inside the chamber while confronting with the at least one substrate, for supplying a high-frequency power to form the plasma; a grounding part provided beneath the susceptor while being untouchable to the susceptor; and an insulating part provided between the susceptor and the grounding part.

Abstract: A dry etching apparatus is disclosed, which is capable of forming a uniform pattern in a substrate surface, the dry etching apparatus for etching at least one substrate through the use of plasma, comprising the at least one substrate placed on a tray inside a chamber; a susceptor, provided inside the chamber while confronting with the at least one substrate, for supplying a high-frequency power to form the plasma; a grounding part provided beneath the susceptor while being untouchable to the susceptor; and an insulating part provided between the susceptor and the grounding part.

Abstract: The present invention provides a susceptor power-interface assembly which is used for a chamber process module that includes a power supply, a process chamber and a susceptor, wherein the susceptor includes a susceptor shaft penetrating a bottom of the process chamber and a susceptor base on which a wafer is disposed for the process. The susceptor power-interface assembly electrically connects the power supply to the susceptor base.

Abstract: The present invention provides a susceptor power-interface assembly which is used for a chamber process module that includes a power supply, a process chamber and a susceptor, wherein the susceptor includes a susceptor shaft penetrating a bottom of the process chamber and a susceptor base on which a wafer is disposed for the process. The susceptor power-interface assembly electrically connects the power supply to the susceptor base.